BiFeO 3 thin films are deposited on FTO coated glass substrates using a simple sol-gel deposition technique, limiting thickness about 70 nm and Ag/BiFeO 3 /FTO RRAM devices are prepared. The devices showed low-voltage bipolar switching with the maximum I on /I off ~ 450, and low set and reset voltages ~ 1.1 V and -1.5 V, respectively. The devices are stable against on-off cycles with ~ 10 4 s retention time without any significant degradation. The variations in the set and reset voltages are 0.4 V and 0.6 V, respectively. We found that ohmic and trap-controlled space charge limited conductions are responsible for low and high resistance states, respectively. The resistive switching mechanism is attributed to the formation and rupturing of the metal filament during the oxidation and reduction of Ag ions for the set and reset states.
Introduction:The resistive random access memory (RRAM) based non-volatile memory devices are attracting attention due to their simple device geometry, high switching speed, low power consumption, longer retention time and switching endurance in conjunction with the possibilities for scaling up towards practical applications. 1-3 This works on the principle of resistive switching, which can be realized in simple metal-insulator-metal (MIM) capacitorlike structures. The RRAM device switches between conducting and non-conducting states by manipulating external stimuli, such as electric field. 4-6 These devices are explored in numerous transition metal oxides and perovskites like HfO 2 7 , TiO 2 8 , Al 2 O 3 9 , Ta 2 O 5 10 ,