Fluorine-Doped Tin Oxide Thin Films Deposition by Sol-Gel Technique

Abstract

In the present work, undoped (SnO 2) and fluorine-doped tin oxide (FTO) thin films were prepared by sol-gel process using a solution composed of (SnCl 2 , H 2 O), (NH 4 F), and ethanol mixture. The fluorine concentration effect on structural, optical and electrical properties of SnO 2 films is investigated. The electrical properties of FTO films prepared by sol gel remain relatively lower than the ones deposited by other techniques. In present paper, we try to elucidate this difference. Films composition and the FTIR analysis, of films and formed precipitate during film growth, indicate that few amounts of fluorine are incorporated in SnO 2 network, most of fluorine atoms remain in the solution. The films resistivity is reduced from 1.1 Ω•cm for undoped films to 3 × 10 −2 Ω•cm for 50 wt.% doped FTO, but remains higher than the reported ones in the literature. This high resistivity is explained in terms of fluorine bonding affinity in the solution.

Sodium Cobalticarborane: A Promising Precatalyst for Oxygen Evolution Reaction

“…Although XRD shows the tetragonal structure of the SnO 2 films for the FTO (JCPDS: 41–1445), no peak related to cobalt oxide or other cobalt-based compounds was observed (Figure b). When carbon paper was used as an electrode, XRD only showed the peaks at (002), (101), and (004), which are attributed to graphite (JCPDS: 41–1487) . As no peak for Co compounds was detected by XRD and Raman analyses, we suggest that the amount of the compound formed on the surface of the electrodes was small or (and) amorphous.…”

“…Raman spectroscopy displays two peaks at 570 and 1100 cm –1 for the FTO, which are attributed to Sn–O and Si–O bonds, respectively. After chronoamperometry at 2.36 V in the presence of 1 (1.4 mM) for 1, 2, and 10 h, no peak related to Co oxide at 550–700 cm –1 was detected (Figure a). , XRD demonstrates strong peaks related to (110), (101), (200), (220), and (211), which are attributed to SnO 2 when the FTO is applied as the electrode . Although XRD shows the tetragonal structure of the SnO 2 films for the FTO (JCPDS: 41–1445), no peak related to cobalt oxide or other cobalt-based compounds was observed (Figure b).…”

Controller of fluorine­doped tin oxide thin films deposition via cycles and annealing temperatures by spin coating techniques

“…This is supported by the research conducted by I. Y. Y. Bu, et al in 2014 who examined sol-gel deposition from FTO glass used for DSSC where the crystal structure obtained was SnO 2 with tetragonal form and the highest peak intensity in the crystal plane was (110) [27]. Amel Adjimi, et al in 2018 [28] said that the crystal plane (110) remains the orientation in research using SnO 2 or undoped. Also, crystal planes (101) and (211) are also formed with relatively lower intensity.…”

Characteristics of ZnO and Al Doped ZnO Thin Films Prepared by Sol Gel Method for Solar Cell Applications

“…Where (h k l) are Miller indices; d hkl is the lattice spacing; θ is half of Bragg angle; and λ is the wavelength of the target XRD. Further, the lattice parameters (a,c) values calculated from the spectra obtained, determined from relation [43]:…”