“…In particular, the highly reactive species such as atomic oxygen or fluorine are the important reaction partners in surface oxidation/fluorination, modification of polymers or plasma etching [1,2]. On the other hand, small fluorocarbon radicals, such as CF, CF 2 , CF 3 , are important species for formation of compounds with higher molecular weight (oligomers) and precursors in thin film deposition [3,4]. In particular, the fluorocarbon species which are immediately involved in the thin film growth are not clearly defined.…”