Fluorescence microscopy for quality control in nanoimprint lithography

Finder, Ch.; Beck, Marc; Seekamp, J.; Pfeiffer, K.; Carlberg, Patrick; Maximov, Ivan; Reuther, F.; Sarwe, Eva-Lena; Zankovic, Sergej; Ahopelto, Jouni; Montelius, Lars; Mayer, Christian; Torres, C. M. Sotomayor

doi:10.1016/s0167-9317(03)00123-0

Cited by 12 publications

(5 citation statements)

References 8 publications

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“…Nanoimprint lithography can mold a variety of polymeric materials (Figure B,C) and pattern features as small as ∼5 nm , and aspect ratios up to ∼20 (height-to-width) . Materials that have been patterned successfully include biomolecules, block copolymers, conducting polymers, , and fluorescently labeled polymers . This process has been used to pattern components for a range of microelectronic, optical, and optoelectronic devices. , For example, gate lengths in a MOSFET have been defined by NIL with a minimum feature size as small as 60 nm …”

Section: 12 Nanoimprint Lithography (Nil)mentioning

confidence: 99%

“…124 Materials that have been patterned successfully include biomolecules, 125 block copolymers, 126 conducting polymers, 127,128 and fluorescently labeled polymers. 129 This process has been used to pattern components for a range of microelectronic, optical, and optoelectronic devices. 130,131 For example, gate lengths in a MOSFET have been defined by NIL with a minimum feature size as small as 60 nm.…”

Section: Nanoimprint Lithography (Nil)mentioning

confidence: 99%

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New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

et al. 2005

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Section: 12 Nanoimprint Lithography (Nil)mentioning

confidence: 99%

Section: Nanoimprint Lithography (Nil)mentioning

confidence: 99%

New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

et al. 2005

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“…The objectives are the visualization of adhering thermoplastic polymers, fabrication of multicolored patterns for display, and study of lasers and optical devices with fluorescent polymers and polymers containing fluorescent dyes and semiconductor nanoparticles. [9][10][11][12][13] We devoted our study to developing fluorescent UVcurable resists for UV nanoimprint lithography for facile defect detection in imprinted patterns such as unleveled residual layer thickness and bubble trap. It is difficult to use semiconductor nanoparticles efficiently emitting fluorescence, because they become contaminated after an oxygen-RIE step in UV nanoimprint lithography.…”

Section: Introductionmentioning

confidence: 99%

Fluorescent UV-Curable Resists for UV Nanoimprint Lithography

Kobayashi

Sakai

Matsui

et al. 2010

Jpn. J. Appl. Phys.

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We developed fluorescent UV-curable resists for UV nanoimprint lithography to readily detect residual layer thickness and analyze its profile in addition to pattern defects by fluorescence microscopy. A fluorescent dye of rhodamine 6G, 2-[6-(ethylamino)-3-(ethylimino)-2,7-dimethyl-3H-xanthen-9-yl]benzoic acid ethyl ester tetrafluoroborate 5a, showed sufficient durability of photobleaching in solution toward UV-light exposure at >350 nm in the absence and presence of a radical photoinitiator. The decrease of fluorescence intensity from the dye in a UV-cured thin film of a radical photopolymerization resin PAK-01 was suppressed at approximately 5% in comparison with the fluorescence intensity before UV-curing at an exposure dose of 1.0 J cm-2 monitored at 365 nm. It was confirmed that the fluorescence intensity of the UV-cured thin film showed a linear correlation to its thickness up to 100 nm. A dye-added PAK-01 resin was successfully available to UV nanoimprint. We demonstrated that the UV-cured thin film of the dye-containing resin was useful for facile confirmation and analysis of residual layer thickness in terms of its homogeneity.

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“…For the first time, Finder et al reported that fluorescent microscopy using thermoplastic polymers doped with a fluorescent dye was useful for visualizing pieces of the polymers stuck to a fluorinated mold surface after thermal nanoimprinting. 17) Although there have been several papers reporting fluorescent resin patterns prepared by UV nanoimprinting 18) and thermal nanoimprinting [19][20][21][22][23] since the first report, these papers dealt with optical applications of fluorescent resin patterns to multicolor emission, 19) optoelectronic and photonic devices, 20) organic light-emission diodes, 21) anisotropic emission systems, 22,23) and so on.…”

Section: Introductionmentioning

confidence: 99%

Fluorescent Microscopy Proving Resin Adhesion to a Fluorinated Mold Surface Suppressed by Pentafluoropropane in Step-and-Repeat Ultraviolet Nanoimprinting

Kobayashi

Kubo

Hiroshima

et al. 2011

Jpn. J. Appl. Phys.

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Resin adsorption on fluorinated silica mold surfaces during step-and-repeat ultraviolet nanoimprinting was studied by fluorescent microscopy using a fluorescent UV-curable resist. The fluorescence intensity indicating resin adsorption to the mold surfaces in step-and-repeat UV nanoimprinting under air atmosphere was significantly higher than that under condensable gas pentafluoropropane (PFP) atmosphere. The larger resin adsorption in air was attributable to sticking uncured resin around trapped air bubbles preventing the UV-curable resist from causing acrylate radical photopolymerization and to the small amount of resin components adhering to the mold surface. The entire adsorption of resin components, not only a fluorescent dye doped in a UV-curable resin, was confirmed by high-sensitivity UV–visible absorption spectroscopy and atomic force microscopy in a frictional mode. PFP suppressed obviously stuck uncured resin and entirely adhered resin components to the fluorinated mold surface. The entire adsorption of resin components was compared among three kinds of fluorinated mold surface treated with commercially available antisticking reagents, FAS13 (tridecafluoro-1,1,2,2-tetrahydro-octyltrimethoxysilane), OPTOOL DSX, and OPTOOL AES4-E. It was proved by the fluorescent microscopy that the fluorinated mold surface prepared by chemical vapor surface modification with FAS13 showed the best antisticking property among the fluorinated mold surfaces, because the entire adsorption of resin components was hardly affected by the number of cycles of step-and-repeat UV nanoimprinting and by the positions in the mold surface.

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Fluorescence microscopy for quality control in nanoimprint lithography

Cited by 12 publications

References 8 publications

New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

Fluorescent UV-Curable Resists for UV Nanoimprint Lithography

Fluorescent Microscopy Proving Resin Adhesion to a Fluorinated Mold Surface Suppressed by Pentafluoropropane in Step-and-Repeat Ultraviolet Nanoimprinting

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