Flow pyrolysis of hexafluorodisilane as a source of highly reactive difluorosilylene

Shock wave and modelling study of the unimolecular dissociation of Si(CH3)2F2: an access to spectroscopic and kinetic properties of SiF2

“…Eqn (8), near to the highpressure limit performs much better than the symmetric form of F(x), i.e. Eqn (7).…”

“…It has been shown that the thermal dissociation of Si 2 F 6 , in a process Si 2 F 6 -SiF 2 + SiF 4 and with a rate constant 10 12.41 exp(À193.5 kJ mol À1 /RT) s À1 , directly produces SiF 2 . 7,8 The thermal dissociation of SiF 4 , on the other hand, in a sequence SiF 4 -SiF 3 -SiF 2 also leads to SiF 2 , but, because of the large thermal stability of SiF 4 , requires considerably higher temperatures than the dissociation of Si 2 F 6 . In the present work, instead of Si 2 F 6 or SiF 4 , it appeared more suitable to use Si(CH 3 ) 2 F 2 as the precursor for SiF 2 .…”