Flow Analysis of Photoresist Spray Coating towards Improving Coverage on Three-Dimensional Structures

A Thermocouple Device Fabricated on Trench Sidewall for Measuring Accurate Temperature of Microfluid

“…Controlling the spray flow is indispensable to achieve the uniform resist deposition. The gas flow was numerically analyzed to reveal the physics of photoresist spray coating [3,4]. The photoresist was spray-coated under the improved conditions.…”

Acoustic modulation and non-contact atomization of droplets based on the Fabry–Pérot resonator

“…The atomized droplet diameter and distribution directly affect the reliability of chipintegrated circuits, as well as the yield and performance of devices. [2][3][4] The conventional spin coating cannot be applied to non-flat wafers because the microstructures on wafers will impede the radial flow of photoresists. Ultrasonic atomization forces the liquid through a small orifice, causing blockage problems, and cannot produce concentrated and small droplets.…”