2017
DOI: 10.1109/tvlsi.2016.2645795
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Floating Gate Nonvolatile Memory Using Individually Cladded Monodispersed Quantum Dots

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Cited by 14 publications
(14 citation statements)
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“…The process can further be optimised, and is potentially useful for the practical realisation of NVM devices. [5] thermal oxidation 7.4 SiO 2 (5.5 nm)/SiO 2 (13 nm) 1.9 V/±4 V Si [2] ball milling and chemical etching 6 SiO 2 (2 nm)/SiO 2 (7 nm) 0.5 V/±5 V Co [6] r e flux heating method 5 SiO 2 (4 nm)/Al 2 O 3 (10 nm) 8 V/±6 V Ni [3,14] microwave assisted synthesis 4 SiO 2 (4 nm)/Al 2 O 3 (10 nm) 1.3 V/±5 V Co [11] e-beam evaporation and thermal annealing 2 SiO 2 (3 nm)/HfO 2 (…”
Section: Discussionmentioning
confidence: 99%
“…The process can further be optimised, and is potentially useful for the practical realisation of NVM devices. [5] thermal oxidation 7.4 SiO 2 (5.5 nm)/SiO 2 (13 nm) 1.9 V/±4 V Si [2] ball milling and chemical etching 6 SiO 2 (2 nm)/SiO 2 (7 nm) 0.5 V/±5 V Co [6] r e flux heating method 5 SiO 2 (4 nm)/Al 2 O 3 (10 nm) 8 V/±6 V Ni [3,14] microwave assisted synthesis 4 SiO 2 (4 nm)/Al 2 O 3 (10 nm) 1.3 V/±5 V Co [11] e-beam evaporation and thermal annealing 2 SiO 2 (3 nm)/HfO 2 (…”
Section: Discussionmentioning
confidence: 99%
“…These nanocrystalline/QD flash memories were limited due to non-uniformity in the QD sizes and inter-dot spacing. Several efforts are ongoing to improve the performance of QD-based NVMs (QDNVMs) including the use of metallic nanocrystals [2] and the replacement of uncladded QDs with cladded QDs [3][4][5][6]. In this Letter, we present a device structure that transforms NVMs into nanosecond, low-power NVRAMs, by directly accessing the floating gate using the QD access channel (QDAC) via drain D2.…”
mentioning
confidence: 99%
“…The drain D2 is 22 nm above the surface of source S and drain D1. The QDs were deposited using the site-specific selfassembly technique [5,6].…”
mentioning
confidence: 99%
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