Flexible micro-optics fabrication by direct laser writing toward CMOS compatible 3D optical circuit

Summitt, Chris; Wang, Sunglin; Johnson, Lee; Zaverton, Melissa; Milster, Tom D.; Takashima, Yuzuru

doi:10.1117/12.2004996

Cited by 4 publications

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“…As previously shown by Summitt et al [1], 45° micro-mirrors can be fabricated using a CMOS compatible hybrid lithography process with buffer coat material WPR 5100 (JSR Micro, Inc.). Because the proposed process is CMOS compatible, waveguides can be fabricated concurrently with optical couplers.…”

Section: Fabrication Of Optical Coupler Via Hybrid Lithographymentioning

confidence: 98%

Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

et al. 2014

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We report a CMOS compatible fabrication and optical characterization of the micrometer scale optical coupler, a 45° mirror-based optical coupler for inter-layer optical coupling. A newly proposed mask-based and mask-less hybrid lithography process enables accurate surface profile of the micrometer sized 45° mirror by using a CMOS compatible buffer coat material. Surface profile inspected by an optical interferometry agrees well with SEM based inspection results. Experimental and theoretical results for routing and coupling of laser beam in 90° will be discussed.

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Section: Fabrication Of Optical Coupler Via Hybrid Lithographymentioning

confidence: 98%

Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

et al. 2014

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“…For example, vertical Si (100) sidewall 5,6 as well as Si (111) which angles 54.7 • with respect to Si (100) plane could be realized by etching in tetramethylammonium hydroxide (TMAH), potassium hydroxide (KOH) and ethylene diamine (EDA). Apart from wet etching, other fabrication techniques that were reported include laser ablation, 7 molding 8 and dicing. 9 45 • angled mirror is highly desirable for 90 • optical beam steering.…”

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confidence: 99%

Formation of 45° Silicon (110) Surface Using Triton X-nSurfactants in Potassium Hydroxide for Infrared Applications

Goh¹,

Guo²,

Chuan³

et al. 2018

ECS J. Solid State Sci. Technol.

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Silicon (Si) micromirrors are an integral feature for many micro-optomechanical systems (MOEMS). Such mirrors are generally wet etched in alkaline solution at elevated temperature. For 90 • beam steering applications, 45 • slanted Si (110) plane is the prime choice fabricated with the incorporation of tensioactive surfactants. Here, Triton-Si and Triton-hydroxide (OH − )/H 2 O interaction using varying hydrophilic chain length Triton (X-45, X-100 and X-405) were investigated. The surfactant concentration was varied from 0 to 1000 ppm in potassium hydroxide (KOH). Triton molecules were shown to adsorb preferentially on (110) than on (100) surface. Longer chain length Triton hampered OH − access to Si surface resulting in slower etch rate. In contrast, contact angle measurement suggested that shorter Triton interfaced better with Si surface. Later, Si wafers etched in Triton 10 ppm -KOH were examined. The measured output for (110) X-45 , (110) X-100 , (110) X-405 and polished Si wafer reference (R q < 5Å) mirrors were 0.58, 0.76, 0.72 and 1.25 mW, respectively. Subsequently, Si-SiO 2 thin film in [HLHL] 2 -substrate configuration was fabricated. Broadband micromirror for use in 3.0-5.5 μm spectrum range was experimentally realized with reflected efficiency of 73%.

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“…Bulk micromachined on-chip mirrors are an important feature in many MEMS and MOEMS devices [126]. Normally, they can be dry or wet etched, laser ablation, molding and dicing [127][128][129][130][131][132][133]. For dry etched mirror, deep etching using deep reactive ion etching (DRIE) are typically employed for the fabrication of vertical mirror.…”

Section: Introductionmentioning

confidence: 99%

Low cost miniaturized spectrometer for mid infrared sensing

Goh¹

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Flexible micro-optics fabrication by direct laser writing toward CMOS compatible 3D optical circuit

Cited by 4 publications

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Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Formation of 45° Silicon (110) Surface Using Triton X-nSurfactants in Potassium Hydroxide for Infrared Applications

Low cost miniaturized spectrometer for mid infrared sensing

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