Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Abstract

We report a CMOS compatible fabrication and optical characterization of the micrometer scale optical coupler, a 45° mirror-based optical coupler for inter-layer optical coupling. A newly proposed mask-based and mask-less hybrid lithography process enables accurate surface profile of the micrometer sized 45° mirror by using a CMOS compatible buffer coat material. Surface profile inspected by an optical interferometry agrees well with SEM based inspection results. Experimental and theoretical results for routing and coupling of laser beam in 90° will be discussed.

Optical Enhancement of Diffraction Efficiency of Texas Instruments Phase Light Modulator for Beam Steering in Near Infrared

“…Phase modulation scheme, single or double, is selected by rotating the QWP in Figure 1b. Phase after modulation is visualized by a Linnik interferometer [8]. With a single-phase modulation, the fringe shifts by half of the fringe period for the π phase shift.…”