Five beam holographic lithography for simultaneous fabrication of three dimensional photonic crystal templates and line defects using phase tunable diffractive optical element

Abstract

This paper demonstrates an approach for laser holographic patterning of three-dimensional photonic lattice structures using a single diffractive optical element. The diffractive optical element is fabricated by recording gratings in a photosensitive polymer using a two-beam interference method and has four diffraction gratings oriented with four-fold symmetry around a central opening. Four first-order diffracted beams from the gratings and one non-diffracted central beam overlap and form a threedimensional interference pattern. The phase of one side beam is delayed by inserting a thin piece of microscope glass slide into the beam. By rotating the glass slide, thus tuning the phase of the side beam, the five beam interference pattern changes from face-center tetragonal symmetry into diamond-like lattice symmetry with an optimal bandgap. Three-dimensional photonic crystal templates are produced in a photoresist and show the phase tuning effect for bandgap optimization. Furthermore, by integrating an amplitude mask in the central opening, line defects are produced within the photonic crystal template. This paper presents the first experimental demonstration on the holographic fabrication approach of three-dimensional photonic crystal templates with functional defects by a single laser exposure using a single optical element. ©2009 Optical Society of America

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

“…Similarly, Figure 6(b) demonstrates a multi-step procedure to create more complex composite patterns. Others have combined MBIL with various lithographic techniques including other mask-based techniques (e.g., proximity or contact lithography) [159,173], electron-beam lithography [81,174,175], electron-beam-induced deposition [176], focused ion-beam lithography [155,177], direct laser writing [77,150,178,179], atomic force microscopy nano-indentation [180], and multi-photon polymerization [181][182][183]. For example, interference lithography has been combined with optical contact lithography to fabricate triple-gate metal-oxide-semiconductor field effect transistors [161].…”

Photonic crystals with defect structures fabricated through a combination of holographic lithography and two-photon lithography

“…5,[10][11][12][13][14][15][16][17] In the case of positive resist, the overexposed material is then dissolved away in the post-exposure processing. The underexposed region forms a periodic network and acts as a 3D PhC template.…”

“…A significant advance has been achieved on the simultaneous fabrication of functional defects in PhC templates by using a multibeam phasecontrolled one-step holographic lithography 15 and by combining the amplitude mask with the phase mask. 16 However, the process still needs to be improved to increase the uniformity of the samples.…”

Spatial light modulator based holographic fabrication of 3D spatially varying photonic crystal templates

“…11,12 Single beam and single optical element setups [13][14][15][16][17][23][24] can now holographically fabricate 2D and 3D photonic crystal templates with ease, and a single diffractive element setup has been shown to simultaneously fabricate photonic crystal templates with line defects. 25 The pattern integrated interference lithography technique effectively simultaneously fabricates photonic crystal templates with defects, 26 and is capable of embedding microcavity defects within a 3D photonic structure. 27 Setups incorporating spatial light modulators present new opportunities to fabricate many of the same structures as traditional holographic lithography setups by generating the appropriate intensity profiles using computer generated holograms.…”