2015
DOI: 10.1016/j.mee.2015.04.009
|View full text |Cite
|
Sign up to set email alerts
|

First principles modeling of electron tunneling between defects in m-HfO2

Abstract: a b s t r a c tDefect assisted electron transfer processes in metal-oxide materials play a key role in a diverse range of effects of relevance to microelectronic applications. However, extracting the key parameters governing such processes experimentally is a challenging problem. Here, we present a first principles based investigation into electron transfer between oxygen vacancy defects in the high-k dielectric material HfO 2 . By calculating electron transfer parameters for defects separated by up to 15 Å we… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
8
0

Year Published

2016
2016
2022
2022

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 14 publications
(8 citation statements)
references
References 19 publications
0
8
0
Order By: Relevance
“…In addition, the simulations reported here and in previous work [18] provide a solid basis for investigation of the nature and energetics of excess hole and electron in hematite/water interfaces, relevant to water splitting photocatalysis [5], crystal growth [80] and biogeochemical transformations [81,82]. The constrained density functional theory method that was previously applied to calculation of electron transfer parameters for hole tunneling in oxide materials [83][84][85] may be extended to such interface problems. Work along these lines is currently ongoing in our laboratory.…”
Section: Discussionmentioning
confidence: 84%
“…In addition, the simulations reported here and in previous work [18] provide a solid basis for investigation of the nature and energetics of excess hole and electron in hematite/water interfaces, relevant to water splitting photocatalysis [5], crystal growth [80] and biogeochemical transformations [81,82]. The constrained density functional theory method that was previously applied to calculation of electron transfer parameters for hole tunneling in oxide materials [83][84][85] may be extended to such interface problems. Work along these lines is currently ongoing in our laboratory.…”
Section: Discussionmentioning
confidence: 84%
“…The electronic coupling constant H ab is then estimated as the difference between the adiabatic and diabatic energies at the transition state. We note a more accurate approach would be to obtain the diabatic solutions at the transition state using constrained DFT and then diagonalizing to obtain the electronic coupling constant as we have done in previous studies. However, the high computational cost of these calculations and large number of pathways make this prohibitive at the present time.…”
Section: Resultsmentioning
confidence: 99%
“… 6 , 43 45 There are many previous applications of the approach to model polaron hopping in TiO 2 , Fe 2 O 3 , and organic semiconductors as well as electron transfer between point defects in crystals. 22 , 26 , 46 48 , 55 , 56 Here, we employ MEHAM with the common approximation that the hole hopping process can be described as a one-dimensional process coupling to a single generalized phonon mode. We note that although we consider a single phonon mode, it includes displacements of all atoms and the wavefunction is not constrained in any way, so it is not the case that adjacent atoms are not involved (in general they all are).…”
Section: Methodsmentioning
confidence: 99%
See 2 more Smart Citations