Finely control groove-depth variations of large-area diffraction gratings

Wu, Lixiang; Qiu, Keqiang; Jiang, Xiaolong; Zheng, Yanchang; Xu, Xin­guang; Ye, Hong; Fu, Shaojun

doi:10.1117/12.2077396

Cited by 1 publication

(2 citation statements)

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“…Hence, in our previous work [4,6], we proposed a new solution for fabricating the large-aperture BSG of high diffraction uniformity as well as algorithms for finely tuning the spatial distribution of etch depths.…”

Section: Introductionmentioning

confidence: 99%

“…In the fabrication of BSGs, we also encounter a similar scenario and need to adjust the spatial distribution of etch depths. But in contrast to the surfacing of X-ray mirrors, the adjustment of etch depths in the fabrication of BSGs is, to some extend, more difficult and requires more flexibility [3,4,6]. On one hand, the etch depths are almost randomly distributed.…”

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confidence: 99%

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Fine-tuning the etch depth profile via dynamic shielding of ion beam

Wu¹,

Qiu²,

Fu³

2016

Nuclear Instruments and Methods in Physics Research Section B:

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We introduce a method for finely adjusting the etch depth profile by dynamic shielding in the course of ion beam etching (IBE), which is crucial for the ultraprecision fabrication of large optics. We study the physical process of dynamic shielding and propose a parametric modeling method to quantitatively analyze the shielding effect on etch depths, or rather the shielding rate, where a piecewise Gaussian model is adopted to fit the shielding rate profile. We have conducted two experiments. In the experiment on parametric modeling of shielding rate profiles, its result shows that the shielding rate profile is significantly influenced by the rotary angle of the leaf. And the experimental result of fine-tuning the etch depth profile shows good agreement with the simulated result, which preliminarily verifies the feasibility of our method.

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Section: Introductionmentioning

confidence: 99%

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confidence: 99%