Filling Behavior Observation on UV Nanoimprint Lithography

Unno, Noriyuki; Osari, Kazutomo; Machinaga, Ken ichi; Taniguchi, Jun; Ohsaki, Takeshi; Sakai, Nobuji

doi:10.2494/photopolymer.22.161

Cited by 2 publications

(1 citation statement)

References 8 publications

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“…The idea behind the development of partial-filling UV-NIL is associated with the presence of a capillary force (P c ) that acts on the substrate owing to differences in the surface energy and the formation of fine nanopatterns [35][36][37] that affect the filling behavior. 29,[38][39][40] The resin filling behaviors of the replica mold are illustrated in Fig.…”

Section: Introductionmentioning

confidence: 99%

Lifetime amelioration of release-agent-free antireflection-structured replica molds by partial-filling ultraviolet nanoimprint lithography

Yusof

Hayashi

Taniguchi

et al. 2015

Jpn. J. Appl. Phys.

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In ultraviolet nanoimprint lithography (UV-NIL), the presence of fluorinated components in a release-agent-free antireflection-structured (RAF-ARS) replica mold is an important factor preventing the adhesion of resin on its surface. Nevertheless, a strong release force (RF), which results from the complete filling of resin in a high-aspect-ratio RAF-ARS replica mold during UV-NIL, degrades its fluorinated components and consequently shortens its lifetime. In this paper, we propose a technique for the lifetime amelioration of RAF-ARS replica molds by partial-filling UV-NIL. Complete-filling UV-NIL was also executed for comparison. We also examined the effects of the filling ratio on an RAF-ARS replica mold. Using the partial-filling UV-NIL technique, we successfully prolonged the lifetime of an RAF-ARS replica mold up to the 100th imprint, compared with the 75th imprint in the case of complete-filling UV-NIL.

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