Fabrication of self-supporting antireflection-structured film by UV–NIL

Yusof, Nurhafizah Binti Abu Talip; Taniguchi, Jun

doi:10.1016/j.mee.2013.03.041

Cited by 15 publications

(9 citation statements)

References 17 publications

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“…Finally, the CGH pattern was transferred onto a silicon wafer by NIL with the inverted mold. When UV-NIL was carried out, the sample was coated with a release agent (Optool DSX; Daikin Industries Co., Tokyo) [14]. The combination of the EB resist and the release agent allows UV-NIL duplication of a pattern with a high aspect ratio (over 3) [15]; the aspect ratio of our target pattern is at the most 1.2.…”

Section: Experimental Methodsmentioning

confidence: 99%

Fabrication of eight-step diffractive optical element for hologram-ROM

Shinonaga

Ogino

Unno

et al. 2015

Microelectronic Engineering

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Section: Experimental Methodsmentioning

confidence: 99%

Fabrication of eight-step diffractive optical element for hologram-ROM

Shinonaga

Ogino

Unno

et al. 2015

Microelectronic Engineering

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“…An EIS-210ER (Elionix, Inc.) ion-beam apparatus equipped with an electron-cyclotron-resonance-type ion source was used. In this work, the ARS was self-assembled on the GCs at low acceleration voltage of 300 V for 60 min of etching condition; details are given in [17]. Fabricated molds at low acceleration voltage can possibly generate small RF during UV-NIL owing to the formation of the narrow pitches and effective heights on the molds.…”

Section: Ars Mold Fabricationmentioning

confidence: 99%

Lifetime amelioration of antireflection structure molds by means of partial-filling ultraviolet nanoimprint lithography

Talipa]Yusof

Hayashi

Taniguchi

et al. 2015

Microelectronic Engineering

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Release coating layer (RCL) becomes an important element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the RCL and affects the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, ameliorate the lifetime of the ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to the 150th imprint, i.e., reflectivity of 0.25 ± 0.15% and transmittance of 94.0 ± 0.50% at visible wavelengths, compared to complete-filling UV-NIL up to the 50th imprint.

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“…Nanoimprint lithography − is used industrially for nanofabrication, and has been used for semiconductors, − patterned media, − and optical devices such as light-emitting diodes, flat panel displays, photonic crystals, and solar cells . Nanoimprint lithography, which uses molded fluid resins cured by exposure to ultraviolet (UV) light, is referred to as UV nanoimprint lithography .…”

Section: Introductionmentioning

confidence: 99%

Selection of Di(meth)acrylate Monomers for Low Pollution of Fluorinated Mold Surfaces in Ultraviolet Nanoimprint Lithography

et al. 2015

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We used fluorescence microscopy to show that low adsorption of resin components by a mold surface was necessary for continuous ultraviolet (UV) nanoimprinting, as well as generation of a low release energy on detachment of a cured resin from a template mold. This is because with low mold pollution, fracture on demolding occurred at the interface between the mold and cured resin surfaces rather than at the outermost part of the cured resin. To achieve low mold pollution, we investigated the radical photopolymerization behaviors of fluorescent UV-curable resins and the mechanical properties (fracture toughness, surface hardness, and release energy) of the cured resin films for six types of di(meth)acrylate-based monomers with similar chemical structures, in which polar hydroxy and aromatic bulky bisphenol moieties and methacryloyl or acryloyl reactive groups were present or absent. As a result, we selected bisphenol A glycerolate dimethacrylate (BPAGDM), which contains hydroxy, bisphenol, and methacryloyl moieties, which give good mechanical properties, monomer bulkiness, and mild reactivity, respectively, as a suitable base monomer for UV nanoimprinting under an easily condensable alternative chlorofluorocarbon (HFC-245fa) atmosphere. The fluorescent UV-curable BPAGDM resin was used for UV nanoimprinting and lithographic reactive ion etching of a silicon surface with 32 nm line-and-space patterns without a hard metal layer.

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Fabrication of self-supporting antireflection-structured film by UV–NIL

Cited by 15 publications

References 17 publications

Fabrication of eight-step diffractive optical element for hologram-ROM

Fabrication of eight-step diffractive optical element for hologram-ROM

Lifetime amelioration of antireflection structure molds by means of partial-filling ultraviolet nanoimprint lithography

Selection of Di(meth)acrylate Monomers for Low Pollution of Fluorinated Mold Surfaces in Ultraviolet Nanoimprint Lithography

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