1999
DOI: 10.1016/s0925-9635(98)00444-0
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Filament metal contamination and Raman spectra of hot filament chemical vapor deposited diamond films

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Cited by 33 publications
(11 citation statements)
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“…The exposed area of the silicon wafer was etched by atomic hydrogen from the gas phase allowing the incorporation of silicon atoms into the growing diamond. Although the presence of impurities in the overgrown material stemming from the filaments (tungsten) could not be completely excluded, due to the relatively low working temperature of the filaments (≈2000 °C) and the short deposition duration (10 min compared to 64 h in ref. ), their concentration should be very low.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The exposed area of the silicon wafer was etched by atomic hydrogen from the gas phase allowing the incorporation of silicon atoms into the growing diamond. Although the presence of impurities in the overgrown material stemming from the filaments (tungsten) could not be completely excluded, due to the relatively low working temperature of the filaments (≈2000 °C) and the short deposition duration (10 min compared to 64 h in ref. ), their concentration should be very low.…”
Section: Methodsmentioning
confidence: 99%
“…Although the presence of impurities in the overgrown material stemming from the filaments (tungsten) could not be completely excluded, due to the relatively low working temperature of the filaments (≈2000 °C) and the short deposition duration (10 min compared to 64 h in ref. ), their concentration should be very low. Mehta Menon et al found that the diamond crystalline quality showed a strong correlation with the impurity level.…”
Section: Methodsmentioning
confidence: 99%
“…The role of the filament material cannot be easily understood if other parameters are taken into account; for example, the filament temperature can be decreased, without losses in the film quality, by addition of very small amounts (¡0.1%) of oxygen or ammonia to the reactant gas mixture (as reported in ref. 47). In these cases, the good crystal quality was not due to metal incorporation in the film, but to a lower substrate temperature, thus giving evidence for the effective presence of synergistic effects.…”
Section: ''Hot Filament'' Cvdmentioning
confidence: 91%
“…Furthermore, the presence of impurities has been proved to influence the quality of the films, as reported by Shaw and co-workers. 47 In their work, a number of diamond films were synthesized and neutron activation analysis was performed to define the metal content of films grown using different filament metals. Differences in the tendency to form twins and in the relative growth rates in the v100w and v111w directions were observed, although not obviously related to the change of filament material during the synthesis.…”
Section: ''Hot Filament'' Cvdmentioning
confidence: 99%
“…HFCVD offers easier scalability since the activation region simply depends upon the area covered by the tungsten or tantalum filaments. However, metal incorporation is possible [16,17], the filament stability is challenging [18] and growth rates are moderately low compared to other methods (∼1.6 µm h −1 ).…”
Section: Introductionmentioning
confidence: 99%