1971
DOI: 10.1016/0038-1098(71)90437-6
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Field effect in tellurium

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Cited by 14 publications
(5 citation statements)
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“…Standard values of ε and m * /m e have been used here, as tabulated byMadelung (1996); our conclusions are not altered if we use instead the somewhat higher value of electron effective mass in Te, m * /m e = 0.12, cited bySilbermann et al (1971). Shallow donors typically ionize at a temperature equivalent to one tenth of their binding energy, thanks to the much greater density of states in the conduction band.…”
mentioning
confidence: 80%
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“…Standard values of ε and m * /m e have been used here, as tabulated byMadelung (1996); our conclusions are not altered if we use instead the somewhat higher value of electron effective mass in Te, m * /m e = 0.12, cited bySilbermann et al (1971). Shallow donors typically ionize at a temperature equivalent to one tenth of their binding energy, thanks to the much greater density of states in the conduction band.…”
mentioning
confidence: 80%
“…It appears to do so in GaAs, for instance, though only in n-type material with hole capture as a minority process (Chow et al 1996). Te is naturally slightly p-type, with a low-T hole concentration of about 10 14 cm −1 (Silbermann et al 1971); this would tend to stabilize the positive ion, at least until the conductivity becomes intrinsic around 200 K. Since it is above 200 K that the chargeexchange relaxation sets in, both electron and hole processes are permitted, as well as participation of the negative ion. It is difficult to imagine an equilibrium between TeMu 0 and Mu + (which would effectively require abstraction analogous to reaction (63) to occur at each charge cycle) but there are two other possibilities which require little or no rearrangement of the local bonding.…”
Section: Intermittent Hyperfine Coupling In Telluriummentioning
confidence: 99%
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“…Most informative are measurements where, a t high transverse field strength, a minimum of conductance is observed which indicates the formation of an inversion layer at the surface. This has been achieved in some cases for germanium and silicon [2] and, more recently, also for tellurium crystals [3]. Besides the calculation of the surface potential, such a minimum in principle allows the investigation of the carrier transport in the inversion layer.…”
Section: Introductionmentioning
confidence: 99%
“…I n conclusion, this calculation shows that for a uniform distribution of surface states, only the states close to the band edges contribute to the impedance of interface. It corresponds to the distribution of surface states determined by Silbermann et al [4] and Lombard [5] for the tellurium surface. We must note too that such a distribution is found for the silicon-silicon dioxide interface a t room temperature.…”
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confidence: 96%