Few micrometers wide, perfectly isolating scribes in transparent conductive oxide layers prepared by femtosecond laser processing

Krause, Stephan; Miclea, P.-T.; Steudel, Franziska; Schweizer, Stefan; Seifert, G.

doi:10.1063/1.4840215

Cited by 18 publications

(15 citation statements)

References 8 publications

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“…Devices based on microelectromechanical systems (MEMS) are used in various applications, including electronics, information technology, biomedicine, and energy‐harvesting systems. As an alternative to the conventional photobeam/e‐beam‐/ion‐beam lithography techniques, laser direct structuring/writing (LDS/LDW) has attracted considerable interest as a simple, maskless, low‐cost method for fabricating 2D and 3D structures of different metals and their oxides . Recently, LPKF Laser & Electronics AG has demonstrated a precise and effective LDS method to produce microstructured layouts.…”

Section: Recent Progress and Advances In Laser Processing Of Metal Oxmentioning

confidence: 99%

Laser Irradiation of Metal Oxide Films and Nanostructures: Applications and Advances

et al. 2018

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Recent technological advances in developing a diverse range of lasers have opened new avenues in material processing. Laser processing of materials involves their exposure to rapid and localized energy, which creates conditions of electronic and thermodynamic nonequilibrium. The laser-induced heat can be localized in space and time, enabling excellent control over the manipulation of materials. Metal oxides are of significant interest for applications ranging from microelectronics to medicine. Numerous studies have investigated the synthesis, manipulation, and patterning of metal oxide films and nanostructures. Besides providing a brief overview on the principles governing the laser-material interactions, here, the ongoing efforts in laser irradiation of metal oxide films and nanostructures for a variety of applications are reviewed. Latest advances in laser-assisted processing of metal oxides are summarized.

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Section: Recent Progress and Advances In Laser Processing Of Metal Oxmentioning

confidence: 99%

Laser Irradiation of Metal Oxide Films and Nanostructures: Applications and Advances

et al. 2018

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“…However, the scribing process with irradiation interval of 3 µm, shows a very good quality of groove width of 6µm and perfectly isolated. This quality can be compared with the P1 fabricated with femtosecond laser, which reported recently by Krause. et al (2014).…”

Section: Spot%diameter%(µm)mentioning

confidence: 75%

Bessel beam laser-scribing of thin film silicon solar cells by ns pulsed laser

Doan

Iida

Kim

et al. 2016

JTST

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Laser ablation of TCO (SnO 2 : F) coating on glass substrates is of special interest as these films are used as a transparent front contact for the thin film solar cells (TFSC). On the TFSC, in order to archive suitable current voltage characteristic and to reduce the ohmic losses, the panel is separated into multiple cells, which are connected in series. This fabrication process involves multiples coating and 3 steps patterning named P1, P2 and P3. During the P1 process, the TCO coating is scribed in line structure and perfectly isolated for the monolithic serial interconection. On the TFSC, width of the grooves of power-generating thin film layers is one of the most important factors to determine its efficiency because size of dead area, where cannot generate electricity, critically depends on it. Traditionally, mechanical scribing is used to fabricate a channel with typical width of hundreds of micrometer and a typical death zone of ~500 micrometers. Compared with mechanical scribing, laser scribing is able to fabricate a smaller channel width, typically ~ few tens of micrometers, so the dead zone can be much smaller, ~240 micrometers, and therefore higher efficiency (Booth et al. 2010 and Burn et al. 2012). However, traditional scribing process with nanosecond laser pulse, which is governed by heating, melting and vaporizing of TCO, has been show to leave a heat affect zone (HAZ) with poor isolation. In order to reduce the HAZ, ultra-short laser pulse, sub-picosecond pulse, is introduced with an optimization of laser parameters. However, industrial adoption is limited due to the immature process and higher cost of ownership which is typically 2x a typical nanosecond laser scribing process (Booth (2010) and Burn (2012)).Backside scribing, which was first introduced by Avagliano et al. (1994), shows great advantages of HAZ free, recast free, shape edges and perfectly isolated (Avagliano et al. 1999 andHeise et al. 2011). In the backside laser ablation process, laser beam is induced from the glass side and is focused on the surface between glass and TCO coating layer. And the TCO layer is removed by thermal stress induced fracture (Heise et al. 2011). As material is removed without melting and evaporation processes, the fabrication is carried out at the small laser energy, without Bulletin of the JSME

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“…Поэтому в настоящее время помимо традиционного оксида индия-олова (ITO), прозрачного в видимой области спектра, но в то же время хрупкого, обрабатываемого на производстве с большим количеством отходов, дорогого и редкого материала, разрабатывают прозрачные электроды из альтернативных материалов. К ним относятся углеродные нанотрубки [4], оксид цинка, легированный бором (ZnO: B) [5] или алюминием (ZnO: Al) [6], оксид олова, легированный фтором (SnO2: F), оксид кадмия, легированный индием (CdO: In), чистые металлы: серебро (Ag), алюминий (Al), медь (Cu) [7] и др.…”

Section: Introductionunclassified

Исследование Параметров Прозрачных Токопроводящих Периодических Структур, Изготовленных Методом Лазерной Абляции

Остриков¹,

Носов²,

Михалёв³

et al. 2022

Оптика И Спектроскопия

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In this paper we report on results of an investigation of a transparent mesh electrode in a wide wavelength range 550 – 2000 nm with low electrical resistance manufactured by laser ablation with using an aluminum film with a thickness of 30 µm on a polyimide substrate with a thickness of 20 µm. The method is implemented using a fiber ytterbium nanosecond laser with a wavelength of radiation 1064 nm. The structure we have obtained has a transmittance > 50% in the designated spectrum range and the electrical resistance < 1.5 Ω/sq.

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Few micrometers wide, perfectly isolating scribes in transparent conductive oxide layers prepared by femtosecond laser processing

Cited by 18 publications

References 8 publications

Laser Irradiation of Metal Oxide Films and Nanostructures: Applications and Advances

Laser Irradiation of Metal Oxide Films and Nanostructures: Applications and Advances

Bessel beam laser-scribing of thin film silicon solar cells by ns pulsed laser

Исследование Параметров Прозрачных Токопроводящих Периодических Структур, Изготовленных Методом Лазерной Абляции

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