Among p–n
junction devices with multilayered heterostructures
with WSe2 and MoSe2, a device with the MoSe2–WSe2–MoSe2 (NPN) structure
showed a remarkably high photoresponse, which was 1000 times higher
than the MoSe2–WSe2 (NP) structure. The
ideality factor of the NPN structure was estimated to be ∼1,
lower than that of the NP structure. It is claimed that the NPN structure
formed a thinner depletion region than that of the NP structure because
of the difference of carrier concentrations of MoSe2 and
WSe2. Hence, the built-in electric field was weaker, and
the motion of the photocarriers was facilitated. These behaviors were
confirmed experimentally from a photocurrent mapping analysis and
Kelvin probe force microscopy. The work function depended on the wavelength
of the illuminator, and quasi-Fermi level was estimated. The surface
photovoltage on the MoSe2 region was higher than that on
WSe2 because the lower bandgap of MoSe2 induces
more electron–hole pair generation.