2005
DOI: 10.1088/0957-4484/16/6/057
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Ferromagnetic nanoclusters hybridized in Mn-incorporated GaInAs layers during metal–organic vapour phase epitaxial growth on InP layers under low growth temperature conditions

Abstract: We demonstrate the successful formation of ferromagnetic nanoclusters in Mn-incorporated GaInAs layers grown by metal-organic vapour phase epitaxy on InP (100) substrates under low growth temperature conditions below 450 °C. We find that MnAs nanoclusters with NiAs-type hexagonal crystallographic structures, which show ferromagnetic characteristics up to a relatively high temperature of about 305 K, are formed near the layer surfaces of Mn-incorporated GaInAs layers grown at 440 °C. After deposition of undoped… Show more

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Cited by 11 publications
(15 citation statements)
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“…Bis-(methylcyclopentadienyl) manganese ((MeCp) 2 Mn) was chosen as a manganese organometallic precursor [3]. The temperature of (MeCp) 2 Mn was controlled at 70 1C in order to increase its vapor pressure.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Bis-(methylcyclopentadienyl) manganese ((MeCp) 2 Mn) was chosen as a manganese organometallic precursor [3]. The temperature of (MeCp) 2 Mn was controlled at 70 1C in order to increase its vapor pressure.…”
Section: Methodsmentioning
confidence: 99%
“…Major advantages of FM III-V hybrids are possible monolithic integration of nanospintronic devices on the III-V compound semiconductor-based integrated circuits (ICs) and strong ferromagnetic coupling above room temperature. We have grown FM III-V hybrids by metal-organic vapor phase epitaxy (MOVPE), in particular, using MnAs nanoclusters embedded in GaInAs/ InP (0 0 1) layers, which is suitable for highly integrated photonic ICs used in optical communication systems [2,3]. In this paper, we demonstrate the successful self-assembled formation of hexagonal ferromagnetic MnAs nanoclusters epitaxially grown on GaInAs/InP (1 1 1) B layers.…”
Section: Introductionmentioning
confidence: 95%
“…͑CH 3 ͒ 3 Ga, ͑CH 3 ͒ 3 Al, ͑CH 3 C 5 H 4 ͒ 2 Mn and 20%-AsH 3 diluted in H 2 were used as source materials for SA-MOVPE. 17 The growth temperature, T g , and the V/Mn ratio, whose definition was given elsewhere, 10 were 800-850°C and 375-1125, respectively. MnAs NCs were formed directly on partially SiO 2 -masked GaAs ͑111͒B wafers ͑Figs.…”
mentioning
confidence: 99%
“…͑CH 3 C 5 H 4 ͒ 2 Mn was chosen as a Mn organometallic precursor. 8 After the growth of GaInAs layers on InP buffer layers, ͑CH 3 C 5 H 4 ͒ 2 Mn was introduced to the MOVPE reactor with AsH 3 . All the layers were grown on diamagnetic InP ͑111͒B wafers, and, as a reference, InP ͑001͒ substrates were used at the same growth runs.…”
mentioning
confidence: 99%
“…5,6 We have pursued FM III-V hybrids, in particular, using MnAs nanoclusters ͑NCs͒ embedded in GaInAs/ InP ͑001͒ layers grown by MOVPE. 7,8 InP-related materials are more suitable for the fabrication of key devices in optical communication systems for 1.3 and 1.55 m wavelength bands. Recently, LT-MBE of III-V DMS, e.g., GaInMnAs, on InP ͑001͒ wafers has been reported, 9,10 and waveguide-type optical isolators using the magneto-optical effects of MnAs NCs have been proposed.…”
mentioning
confidence: 99%