2012
DOI: 10.3938/jkps.60.272
|View full text |Cite
|
Sign up to set email alerts
|

Ferroelectric properties of Zn- and Ti-doped BiFeO3 thin films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2018
2018
2022
2022

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 9 publications
(1 citation statement)
references
References 18 publications
0
1
0
Order By: Relevance
“…The dielectric constants of the BFZO films with x = 0, 0.05 and 0.1 were 107, 146 and 170, respectively. Lee et al prepared Bi 1.05 FeO 3 and Bi 1.05 Fe 0.09 Zn 0.01 O 3 films by a pulsed laser deposition method. 2Pr and 2Ec values of the BFZO films were 107 μC/cm 2 and 540 kV/cm, respectively, and the leakage current density was approximately two orders of magnitude lower than the leakage current density of BFO films.…”
Section: Introductionmentioning
confidence: 99%
“…The dielectric constants of the BFZO films with x = 0, 0.05 and 0.1 were 107, 146 and 170, respectively. Lee et al prepared Bi 1.05 FeO 3 and Bi 1.05 Fe 0.09 Zn 0.01 O 3 films by a pulsed laser deposition method. 2Pr and 2Ec values of the BFZO films were 107 μC/cm 2 and 540 kV/cm, respectively, and the leakage current density was approximately two orders of magnitude lower than the leakage current density of BFO films.…”
Section: Introductionmentioning
confidence: 99%