“…However, for the thin film form, it suffers the drawback of the serious leakage problem, which is caused by the high volatility of A-site elements and partial valance transfer of B-site element during the annealing process [6]. Until now, several approaches have been focus on improving the insulating property of the NBT-based thin films, such as optimization of growth conditions [7], construction of multilayer structure [8], and site-engineering [9,10]. Among these methods, ion substitution is an easy and effective way to reduce the leakage current.…”