Femtosecond pulse damage behavior of oxide dielectric thin films

Mero, Mark; Liu, Jianhua; Zeller, Joachim; Rudolph, Wolfgang; Starke, K.; Ristau, Detlev

doi:10.1117/12.524571

Cited by 9 publications

(10 citation statements)

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“…Clearly femtosecond laser damage is much more intrinsic in nature. 6,7 Another striking difference from last year's long pulse results is the number of deposition processes and the number of different materials that yield comparably high laser resistance as illustrated in figures 5 and 6.…”

Section: Resultsmentioning

confidence: 96%

Thin film femtosecond laser damage competition

et al. 2009

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In order to determine the current status of thin film laser resistance within the private, academic, and government sectors, a damage competition was started at the 2008 Boulder Damage Symposium. This damage competition allows a direct comparison of the current state of the art of high laser resistance coatings since they are tested using the same damage test setup and the same protocol. In 2009 a high reflector coating was selected at a wavelength of 786 nm at normal incidence at a pulse length of 180 femtoseconds. A double blind test assured sample and submitter anonymity so only a summary of the results are presented here. In addition to the laser resistance results, details of deposition processes, coating materials and layer count, and spectral results will also be shared.

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Section: Resultsmentioning

confidence: 96%

Thin film femtosecond laser damage competition

et al. 2009

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“…These materials were chosen because of their wide band gap and previous demonstration of high laser damage threshold for evaporated coatings. 5,6 High reflectors of ZrO 2 /SiO 2 consisted of nineteen quarter wave layers centered at 1.064µm and had 99.9% reflectance. High reflectors of HfO 2 /SiO 2 consisted of twenty-one layer quarter wave layers centered at 1.064µm and had 99.8% reflectance.…”

Section: Coating Designs and Film Materialsmentioning

confidence: 99%

Damage thresholds of HfO 2 /SiO 2 and ZrO 2 /SiO 2 high reflectors at 1.064 microns deposited by reactive DC magnetron sputtering

et al. 2005

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HfO 2 /SiO 2 and ZrO 2 /SiO 2 high reflectors at 1.064 µm were deposited by pulsed reactive DC magnetron sputtering. These dielectric thin film high reflectors were deposited with and without the use of an electron source. The electron source greatly decreased arcing of the magnetrons during the deposition process resulting in thin films with fewer defects. The high reflectors were laser damage tested at 1.064 µm. The optical properties of the thin film coatings were characterized prior to laser damage testing. Optical characterization techniques included angle resolved scatter (BRDF), total integrated scatter (TIS), and adiabatic calorimetry. The dependence of the laser damage threshold and optical properties on deposition conditions is reported.

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“…Because of this unique feature, the femtosecond laser-induced damage has been attracting much interest as a novel micro-materials-processing technique. [1][2][3][4][5] However, the fundamental mechanism of laser-induced damage has not been clearly understood yet.…”

Section: Introductionmentioning

confidence: 98%

First-principles calculations for initial electronic excitation in dielectrics induced by intense femtosecond laser pulses

Sato

Yabana

2016

SPIE Proceedings

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Laser-induced damage of SiO 2 (α-quartz) is investigated by first-principles calculations. The calculations are based on a coupled theoretical framework of the time-dependent density functional theory and Maxwell equation to describe strongly-nonlinear laser-solid interactions. We simulate irradiation of the bulk SiO 2 with femtosecond laser pulses and compute energy deposition from the laser pulse to electrons as a function of the distance from the surface. We further analyze profiles of laser-induced craters, comparing the transferred energy with the cohesive energy of SiO 2 . The theoretical crater profile well reproduces the experimental features for a relatively weak laser pulse. In contrast, the theoretical result fails to reproduce the measured profiles for a strong laser pulse. This fact indicates a significance of the subsequent atomic motions that take place after the energy transfer ends for the formation of the crater under the strong laser irradiation.

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Femtosecond pulse damage behavior of oxide dielectric thin films

Cited by 9 publications

References 0 publications

Thin film femtosecond laser damage competition

Thin film femtosecond laser damage competition

Damage thresholds of HfO 2 /SiO 2 and ZrO 2 /SiO 2 high reflectors at 1.064 microns deposited by reactive DC magnetron sputtering

First-principles calculations for initial electronic excitation in dielectrics induced by intense femtosecond laser pulses

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