2019
DOI: 10.1016/j.apsusc.2019.01.198
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Femtosecond laser patterning of graphene electrodes for thin-film transistors

Abstract: Email address: kasischke@lat.rub.de (Maren Kasischke) The aim of this study is to assess femtosecond laser patterning of graphene in air and in vacuum for the application as source and drain electrodes in thin-film transistors (TFTs). The analysis of the laser-patterned graphene with scanning electron microscopy, atomic force microscopy and Raman spectroscopy showed that processing in vacuum leads to less debris formation and thus re-deposited carbonaceous material on the sample compared to laser processing… Show more

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Cited by 16 publications
(5 citation statements)
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References 41 publications
(49 reference statements)
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“…In 2001, before single layer graphene was experimentally discovered, Jeschke et al [53] identified by means of molecular dynamics simulations a new ablation mechanism of thin graphite films at fluences below the threshold for the damage of graphite planes (∼170 mJ cm −2 ). The last decade much work has been done [54][55][56][57][58][59][60][61][62][63][64][65][66][67][68][69] for the optimization of fs laser patterning processes in graphene by investigating the dependence of ablation process on the fs laser exposure parameters (e.g. fluence, pulse energy, pulse duration, repetition rate, exposure time and scanning speed).…”
Section: Introductionmentioning
confidence: 99%
“…In 2001, before single layer graphene was experimentally discovered, Jeschke et al [53] identified by means of molecular dynamics simulations a new ablation mechanism of thin graphite films at fluences below the threshold for the damage of graphite planes (∼170 mJ cm −2 ). The last decade much work has been done [54][55][56][57][58][59][60][61][62][63][64][65][66][67][68][69] for the optimization of fs laser patterning processes in graphene by investigating the dependence of ablation process on the fs laser exposure parameters (e.g. fluence, pulse energy, pulse duration, repetition rate, exposure time and scanning speed).…”
Section: Introductionmentioning
confidence: 99%
“…Two types of surface modification can be observed: the wide gray stripes of ~4 µm width indicate the removal of graphene, and the narrow dark lines with the width below 1 µm are due to the modified surface of the sapphire substrate. The laser fluence at the center of the Gaussian beam at the focal plane was ~9 J/cm 2 , which was significantly above the ablation threshold of both graphene (~70 mJ/cm 2 [ 16 ]) and sapphire (~2 J/cm 2 [ 24 ]). Changing the distance between the focusing lens and the sample surface led to laser beam defocusing and a larger spot diameter, which, in turn, produced lower laser fluence.…”
Section: Resultsmentioning
confidence: 99%
“…Achieving accurate control and high reproducibility of graphene masks requires reliable patterning techniques, such as lithography. An attractive possibility to pattern graphene lies in using the ultrafast lasers [ 16 , 17 ]. Being contactless, this method reduces undesired modification of graphene, while due to its limited thermal influence, it can be applied for patterning graphene on sensitive substrates.…”
Section: Introductionmentioning
confidence: 99%
“…Studies on femtosecond laser patterning of graphene electrodes for thin-film transistors showed that the quality of the patterned electrodes was enhanced by ablation in vacuum conditions due to debris reduction [190]. Femtosecond laser ablation has been adopted by Maurice et al for obtaining nanogaps in monolayer graphene, opening a promising path for development of graphene-based nanogap systems for molecular electronics, memories and nanodevices [191].…”
Section: Treatments Based On Laser Ablationmentioning
confidence: 99%