The emission efficiency droop and internal quantum efficiency (IQE) in AlGaN epilayers and heterostructures were investigated by studying photoluminescence intensity dependence on excitation power density at different temperatures in the range from 8 to 300 K in three AlGaN samples with similar Al content (33%-35%) and different strength of carrier localization: an epilayer and multiple quantum wells with well widths of 5.0 and 2.5 nm. It is shown that the phenomena leading to the efficiency droop strongly influence the photoluminescence intensity dependence on temperature and, therefore, affect the estimation of IQE based on this dependence. A procedure to optimize the determination of IQE is proposed.

Time-resolved photoluminescence and light-induced transient grating measurements of GaN epilayers show that the photoluminescence decay can be described by two coupled exponential terms and that carrier mobility and lifetime in GaN epilayers are correlated within the model which accounts for nonradiative carrier recombination predominantly at dislocations. The obtained results demonstrate that migration-enhanced metalorganic chemical vapor deposition (MEMOCVD™) allows for growth of high-quality GaN epilayers on sapphire substrates with the dislocation density close to 108cm−2, carrier lifetime as long as 2 ns, and ambipolar diffusion coefficient of 2.1cm2s−1 corresponding to the hole mobility of approximately 40cm2V−1s−1.

Excitation-power dynamics of near-band-edge photoluminescence (PL) peak position in In x Ga 1−x N / GaN multiple quantum wells ͑x ϳ 0.15͒ was analyzed as a function of well width. The analysis was based on energy reference provided by photoreflectance (PR) spectra. The difference in spectral position of the PR feature and low-excitation PL band (the Stokes Shift) revealed carrier localization energy, which exhibited a remarkable sensitivity to the well width, increasing from 75 meV in 2 nm wells to about 250 meV in 4 nm wells. Meanwhile collating of the PR data with the flat-band model for the optical transition energy in quantum wells rendered a relatively weak ͑0.5 MV/ cm͒ built-in piezoelectric field. The blueshift of the PL peak position with increasing photoexcitation power density was shown to be in qualitative agreement with the model of filling of the band-tail states with some contribution from screening of built-in field in the thickest ͑4 nm͒ wells. Increased incident photon energy resulted in an additional blueshift of the PL peak, which was explained by a nonthermalized distribution of localized carriers and/or carrier localization in the interface region. Our results are consistent with a concept of emission from partially relaxed large In-rich regions with internal band potential fluctuations, which are enhanced with increasing the growth time.

Remote epitaxy via graphene has recently attracted significant attention, since it provides the possibility to lift-off the grown epitaxial layer, reuse the substrate, and produce flexible devices. However, extensive research is still necessary to fully understand the III-nitride formation on the van der Waals surface of a two-dimensional material and utilize remote epitaxy to its full potential. In this work, the growth of a GaN epilayer using a GaN/sapphire template covered with monolayer graphene is presented. Metalorganic vapor phase epitaxy is chosen to fabricate both the template and the nitride epilayer on top as a cost-effective approach toward GaN homoepitaxy. One-step and multi-step growth temperature protocols are demonstrated while paying particular attention to the graphene interface. GaN seed formation on graphene is analyzed to identify remote epitaxy. Crystalline quality improvement of the epilayer by adjusting the growth parameters is further discussed to provide useful insights into GaN growth on a GaN/sapphire template via monolayer graphene.

Photoluminescence studies of carrier dynamics in AlGaN epilayers with different degrees of carrier localization and densities of nonradiative recombination centers show that the prevailing droop mechanism in AlGaN epilayers with strong carrier localization and comparatively high density of nonradiative recombination centers is enhanced nonradiative recombination due to the carrier delocalization at elevated carrier density. The photoluminescence was investigated under quasi-steady-state excitation in the temperature range from 8 to 300 K. The results proved that the onset of this droop effect is below the threshold for the droop due to high-density effects in the epilayers, such as carrier heating, phase space filling, nonradiative Auger recombination, and stimulated emission.

The influence of carrier localization on photoluminescence efficiency droop and stimulated emission is studied in AlGaN multiple quantum wells with different strength of carrier localization. We observe that carrier delocalization at low temperatures predominantly enhances the nonradiative recombination and causes the droop, while the main effect of the delocalization at elevated temperatures is enhancement of PL efficiency due to increasing contribution of bimolecular recombination of free carriers. When the carrier thermal energy exceeds the dispersion of the potential fluctuations causing the carrier localization, the droop is caused by stimulated carrier recombination.

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A set of Al0.35Ga0.65N∕Al0.49Ga0.51N multiple quantum wells (MQWs) with fixed barrier width and well widths varying from 1.65to5.0nm has been grown by metal-organic chemical vapor deposition. Carrier dynamics in the MQWs were studied using time-resolved photoluminescence (PL) spectroscopy and light-induced transient grating (four wave mixing) technique. The authors observed that the lifetime of nonequilibrium carriers (excitons) increases with decreasing well width and interpreted the effect by stronger localization preventing their migration to nonradiative recombination centers. Meanwhile the radiative decay time is also influenced by screening of the built-in electric field, which spatially separates the electrons and holes. It is shown that this effect affects the initial part of PL intensity decay after pulsed excitation. It becomes more pronounced with increase in the initial carrier density but saturates when the carrier density is high enough to completely screen the built-in electric field. The screening effect on PL decay is stronger in wider quantum wells.