2022
DOI: 10.1007/s11771-022-5153-z
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Femtosecond-laser direct writing 3D micro/nano-lithography using VIS-light oscillator

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Cited by 18 publications
(16 citation statements)
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“…This unique transition is not allowed for the 1PA transition, the 2PA spectrum peak in terms of frequency is usually higher than half of that of the 1PA peak. The three-photon absorption process and other multiphoton absorption are also following similar rules [63,64]. Figure 3(b) illustrates that while the absorbed energy in the OPA process is linear with respect to UV light intensity I, 2PA follows a nonlinear relationship where the absorbed energy is proportional to the square of NIR light intensity I 2 .…”
Section: Tpp Technologymentioning
confidence: 82%
See 1 more Smart Citation
“…This unique transition is not allowed for the 1PA transition, the 2PA spectrum peak in terms of frequency is usually higher than half of that of the 1PA peak. The three-photon absorption process and other multiphoton absorption are also following similar rules [63,64]. Figure 3(b) illustrates that while the absorbed energy in the OPA process is linear with respect to UV light intensity I, 2PA follows a nonlinear relationship where the absorbed energy is proportional to the square of NIR light intensity I 2 .…”
Section: Tpp Technologymentioning
confidence: 82%
“…Alongside 2PA, other mechanisms, such as linear absorption, super-linear absorption, avalanche effects, and thermal accumulation, can also be harnessed in photopolymerization processes. These diverse mechanisms offer varied means to initiate and control the polymerization reaction, affording versatility in the design and fabrication of 3D structures [63,64]. Additionally, the scope of photopolymerization techniques has expanded beyond the use of solely NIR light, with visible (VIS) light oscillators being extensively utilized for 3D micro/nanolithography [64].…”
Section: Tpp Technologymentioning
confidence: 99%
“…Materials. Pure SZ2080™ (IESL-FORTH, Greece) prepolymer without PI was chosen due to having excellent optical and mechanical properties for sub-100 𝜇m micro-prototyping and additive manufacturing applications [21]. SZ2080™ is a hybrid organically modified silicate, specifically designed for Multi-Photon Lithography (MPL) [22].…”
Section: Methodsmentioning
confidence: 99%
“…However, the studies focused on material, photoinitiating systems, or some sole laser parameters, thus making it difficult to compare or extract the fundamental requirements for photopolymerization. Recently, it was demonstrated that a non‐photosensitized resin can be used and photopolymerization can be triggered by non‐amplified laser pulses, [ 268 ] where both are necessary requirements by conventional wisdom. [ 57 ] Moreover, current studies reveal that the laser wavelength is not of crucial importance for TPL as long as ultrafast pulses are used, thus enabling various confined photo‐excitation mechanism leading “toward perfect polymerization”.…”
Section: Fabrication Technologiesmentioning
confidence: 99%