Fast measurement of a pulsed plasma using a Fourier cutoff probe

Na, B K; You, Kwang Ho; Kim, D W; Seo, Byonghoon; Chang, Hong‐Young; You, S. J.; Lee, Y S

doi:10.1088/1748-0221/7/04/c04022

Cited by 1 publication

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References 32 publications

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“…The probe can measure the plasma frequency and thus plasma density in real time. It can also measure the electron-neutral collision frequency 13 and the electron density in a pulsed plasma by the "Fourier cutoff" 14 and can be used to study the plasma sheath. 15,16 The CP has been theoretically studied and confirmed since it has been investigated through computer simulation and a simple circuit model.…”

Section: Introductionmentioning

confidence: 99%

Investigation of reliability of the cutoff probe by a comparison with Thomson scattering in high density processing plasmas

Seo

Kim

et al. 2017

Physics of Plasmas

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A "cutoff probe" uses microwaves to measure the electron density in a plasma. It is particularly attractive because it is easy to fabricate and use, its measurement is immune to surface contamination by dielectric materials, and it has a straightforward analysis to measure electron density in real time. In this work, we experimentally investigate the accuracy of the cutoff probe through a detailed comparison with Thomson scattering in a low temperature, high density processing plasma. The result shows that the electron density measured by the cutoff probe is lower than that by Thomson scattering and that the discrepancy of the two results becomes smaller as the gap between the two tips increases and/or the neutral gas pressure decreases. The underestimated electron density found by the cutoff probe can be explained by the influence of the probe holder, which becomes important as the pressure increases and the gap gets closer.

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