2013
DOI: 10.1016/j.tsf.2013.02.123
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Fast deposition of diamond-like carbon films by radio frequency hollow cathode method

Abstract: Diamond-like carbon (DLC) thin films were deposited on p-type Si (100) substrates by RF hollow cathode method under different RF power and pressure, using ethane as the precursor gas. The deposition rate of 45 nm/min was achieved, almost 4 times higher than by conventional radio frequency plasma enhanced chemical vapor deposition. The mechanism of fast DLC films deposition is attributed to high plasma density in RF hollow cathode method, discussed in this paper. Scanning electron microscopy and Raman spectrosc… Show more

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Cited by 16 publications
(4 citation statements)
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“…Ohtsu et al [34] have used MH cathode discharges with small diameter (D = 5 mm) and depth (W = 15 mm) of holes to achieve the high-growth rate of amorphous hydrocarbon (a-C:H) thin films. In reference [35], the authors used the parallel plates form of an RF hollow cathode, with cathode-to-cathode distance equal to 45 mm for deposition of diamond like carbon (DLC) thin films. A hollow cathode with a diameter of 15.5 mm and a depth of 36 mm was used for the treatment of nanoparticles, plasma polymerization and nanocomposite fabrication [21].…”
Section: Introductionmentioning
confidence: 99%
“…Ohtsu et al [34] have used MH cathode discharges with small diameter (D = 5 mm) and depth (W = 15 mm) of holes to achieve the high-growth rate of amorphous hydrocarbon (a-C:H) thin films. In reference [35], the authors used the parallel plates form of an RF hollow cathode, with cathode-to-cathode distance equal to 45 mm for deposition of diamond like carbon (DLC) thin films. A hollow cathode with a diameter of 15.5 mm and a depth of 36 mm was used for the treatment of nanoparticles, plasma polymerization and nanocomposite fabrication [21].…”
Section: Introductionmentioning
confidence: 99%
“…This effect is obtained when two parallel plates are cathodically polarized, so that an electron present between them is repeatedly repelled before leaving the inside 24 . Through the use of the active screen system, a better electrons confinement effect was obtained in comparison to the active screen partial system.…”
mentioning
confidence: 99%
“…They found that 10 µm coating has more wear resistance. Pang, et al [20] deposited DLC lms on p-type Si (100) substrates using the RF hollow cathode method and obtained a deposition rate of 45 nm/min deposition rate. The higher deposition rate is obtained at higher plasma density.…”
Section: Introductionmentioning
confidence: 99%