Fast coating of ultramicroelectrodes with boron-doped nanocrystalline diamond

Silva, E.L.; Neto, M.A.; Fernandes, A.J.S.; Bastos, A.C.; Silva, R.F.; Zheludkevich, Mikhail L.; Oliveira, F.J.

doi:10.1016/j.diamond.2010.06.023

Cited by 9 publications

(3 citation statements)

References 40 publications

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“…Rarely, the morphology is different from that shown for undoped-NCD. However it may vary slightly according to the experimental conditions, substrate used, and so forth [93][94][95]. In Figure 8 is shown the surface of BDND film grown on a silicon substrate obtained in Diamond Laboratory of LAS/INPE (São Paulo, Brazil).…”

Section: Boron-doped Nanocrystalline Diamond Electrodesmentioning

confidence: 99%

Nanodiamond Films for Applications in Electrochemical Systems

Azevedo

Baldan

Ferreira

2012

International Journal of Electrochemistry

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The purpose of the present paper is to give an overview on the current development status of nanocrystalline diamond electrodes for electrochemical applications. Firstly, we describe a brief comparison between the general properties of nanocrystalline diamond (undoped and boron-doped) and boron-doped microcrystalline diamond films. This is followed by a summary of the nanodiamond preparation methods. Finally, we present a discussion about the undoped and boron-doped nanocrystalline diamond and their characteristics, electrochemical properties, and practical applications.

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Section: Boron-doped Nanocrystalline Diamond Electrodesmentioning

confidence: 99%

Nanodiamond Films for Applications in Electrochemical Systems

Azevedo

Baldan

Ferreira

2012

International Journal of Electrochemistry

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“…Bergonzo et al have shown that diamond coatings can be conformally grown over conducting threedimensional silicon structures generating arrays of threedimensional diamond electrodes [14] and Ganesan et al have demonstrated a freestanding penetrating microelectrode array [15]. Examples of electrodes fabricated through diamond coating of fine metal wires also exist [16,17]. The hardness of diamond potentially permits these three-dimensional structures to be made very small whilst maintaining a low risk of breakage, meaning that charge injection thresholds for neural response can be significantly reduced by using penetrating electrodes that are in close proximity to the target neuron.…”

Section: Introductionmentioning

confidence: 99%

Ultra-nanocrystalline diamond electrodes: optimization towards neural stimulation applications

et al. 2011

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Diamond is well known to possess many favourable qualities for implantation into living tissue including biocompatibility, biostability, and for some applications hardness. However, conducting diamond has not, to date, been exploited in neural stimulation electrodes due to very low electrochemical double layer capacitance values that have been previously reported. Here we present electrochemical characterization of ultra-nanocrystalline diamond electrodes grown in the presence of nitrogen (N-UNCD) that exhibit charge injection capacity values as high as 163 µC cm(-2) indicating that N-UNCD is a viable material for microelectrode fabrication. Furthermore, we show that the maximum charge injection of N-UNCD can be increased by tailoring growth conditions and by subsequent electrochemical activation. For applications requiring yet higher charge injection, we show that N-UNCD electrodes can be readily metalized with platinum or iridium, further increasing charge injection capacity. Using such materials an implantable neural stimulation device fabricated from a single piece of bio-permanent material becomes feasible. This has significant advantages in terms of the physical stability and hermeticity of a long-term bionic implant.

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“…Boron-doped diamond (BDD) possesses unusual physical and chemical properties, such as high hardness, a very wide range of electrochemical potential and low voltammetric background current in an aqueous medium, corrosion stability, et al, that identify it as an interesting material for electrochemical applications [1,2]. The electrical behaviour of BDD films varies from insulating, semiconducting to metallic, depending on the doping amount [3].…”

Section: Introduction mentioning

confidence: 99%

Morphology and Structure Properties of Boron-doped Diamond Films Prepared by Hot Cathode Direct Current Plasma Chemical Vapor Deposition

Pan¹,

Peng²,

Zhao³

et al. 2016

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Boron-doped diamond (BDD) films were deposited by hot cathode direct current plasma chemical vapor deposition (HCDC-PCVD) according to various mixture ratios of CH4/H2/B(OCH3)3 gas. The Raman performances and surface morphologies of the BDD films were then characterized by Raman spectroscopy and scanning electron microscopy (SEM). Results indicated that the flow rate of B(OCH3)3 had marked effects on the growth characteristics of the produced boron-doped diamond films. The presence and concentration of the doped boron atoms significantly altered both the surface morphologies and structures of the diamond films. With increasing flow rate of B(OCH3)3, the crystal grain surfaces became smooth as visible under SEM. The B-doping levels in these films increased from 1.75 × 10 19 cm -3 to a maximum of 2.4 × 10 21 cm -3 , estimated from the Raman spectra.

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Fast coating of ultramicroelectrodes with boron-doped nanocrystalline diamond

Cited by 9 publications

References 40 publications

Nanodiamond Films for Applications in Electrochemical Systems

Nanodiamond Films for Applications in Electrochemical Systems

Ultra-nanocrystalline diamond electrodes: optimization towards neural stimulation applications

Morphology and Structure Properties of Boron-doped Diamond Films Prepared by Hot Cathode Direct Current Plasma Chemical Vapor Deposition

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