Fast algorithms for data reduction in modern optical three-dimensional profile measurement systems with MMX technology

Fleischer, Matthias; Windecker, Robert; Tiziani, Hans J.

doi:10.1364/ao.39.001290

Cited by 57 publications

(29 citation statements)

References 6 publications

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“…Therefore a lock-in detection can be realized effectively by using modern MMX technology. 19 MMX is the multimedia extention of the processor instruction set, enabling fast parallel processing of several pixels within a few clock circles.…”

Section: Signal Evaluationmentioning

confidence: 99%

One-grating projection for absolute three-dimensional profiling

et al. 2001

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A new method for absolute 3-D profiling, based on the fringe projection technique using a vertical scan mode, is described. With a combined measurement of the modulation and the phase it is possible to acquire the topography without any ambiguity problems by using one grating period only. Consequently, the vertical measurement range is limited only by the free working distance and the resolution is comparable to standard fringe projection techniques. We present a microscopic solution, based on a zoom stereo microscope, which enables interesting applications in an extended microscopic range, such as the measurement of microcomponents and microshapes, for example.

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Section: Signal Evaluationmentioning

confidence: 99%

One-grating projection for absolute three-dimensional profiling

et al. 2001

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“…5 By additionally evaluating the phase of the interference signal sub-nanometer height resolution can be achieved. 1,5,6 To solve the ambiguity problem of phase evaluation the envelope is used to determine the corresponding fringe order. This procedure results in a comparable accuracy to conventional phase-shifting interferometry.…”

Section: Introductionmentioning

confidence: 99%

“…Due to the fringe order determination also height steps can be measured correctly. 6,8 The subject we address in this paper is the lateral resolution in SWLI. For many measuring objects the height resolution of SWLI is more than sufficient, but the increasing miniaturization also demands better lateral resolution.…”

Section: Introductionmentioning

confidence: 99%

Low coherent Linnik interferometer optimized for use in nano-measuring machines

Niehues

Lehmann

Xie

2012

Meas. Sci. Technol.

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The precise acquisition of three-dimensional geometrical data in micro-and nanotechnology is crucial for advanced fabrication processes. Scanning white-light interferometry (SWLI) achieves nanometer resolution in the axial direction, but the lateral resolution is far more critical. The requirements for an areal measuring optical sensor in a Nano Measuring Machine are very high. The resolution in every dimension and the working distance have to be as high as possible. In contrast to a Mirau interferometer a Linnik interferometer does not need any components in front of the objective lens. This benefit permits both, a long working distance and a high lateral resolution. In the EC-funded project "NanoCMM" we developed a Linnik interferometer providing a working distance of more than 5 mm and a lateral resolution of 0.3 μm. With this interferometer we measured the full modulation depth and the rectangular shape of a pitch standard close to the Rayleigh resolution limit.

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“…However, recent fast algorithms for data reduction have made acceptable run times possible. 5,6 Spectrally resolved white light interferometry has recently been proposed for profilometry. 7,8 This method does not require OPD scanning.…”

Section: Introductionmentioning

confidence: 99%

“…5 For a 5-m vertical range, this would require 77 steps. The SRWLI, on the other hand, gives a 2-D ͑line͒ profile of the object.…”

Section: Introductionmentioning

confidence: 99%

Analysis of spectrally resolved white light interferograms: use of a phase shifting technique

2001

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The phase at different pixels along the direction of dispersion, also known as the chromaticity axis, is determined in spectrally resolved white light interferometry (SRWLI). Phase shifting interferometry has been used for this purpose. Previously, the phase shifted intensity values required for phase calculation were obtained from phase shifts due to wavelength variation (spatial phase shifting). This required the intensity values from different pixels be used in the calculations, resulting in errors due to variation in pixel sensitivity. We propose to use multiple intensity values, required for phase calculation obtained from the same pixel, and investigate the use of a polarization phase shifter and the conventional PZT phase shifter for this purpose. The polarization phase shifter aims at introducing nearly the same phase shift (achromatic phase shift) at all the pixels receiving light of different wavelengths. In the PZT phase shifter, the phase shift varies considerably at different pixels, but analysis shows that good measurements can still be made with it.

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Fast algorithms for data reduction in modern optical three-dimensional profile measurement systems with MMX technology

Cited by 57 publications

References 6 publications

One-grating projection for absolute three-dimensional profiling

One-grating projection for absolute three-dimensional profiling

Low coherent Linnik interferometer optimized for use in nano-measuring machines

Analysis of spectrally resolved white light interferograms: use of a phase shifting technique

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