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2015
DOI: 10.1021/am508319h
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Facile Fabrication of Robust Silk Nanofibril Films via Direct Dissolution of Silk in CaCl2–Formic Acid Solution

Abstract: In this study, we report for the first time a novel silk fibroin (SF) nanofibrous films with robust mechanical properties that was fabricated by directly dissolving silk in CaCl2-formic acid solution. CaCl2-FA dissolved silk rapidly at room temperature, and more importantly, it disintegrated silk into nanofibrils instead of separate molecules. The morphology of nanofibrils crucially depended on CaCl2 concentrations, which resulted in different aggregation nanostructure in SF films. The SF film after drawing ha… Show more

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Cited by 135 publications
(129 citation statements)
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References 50 publications
(111 reference statements)
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“…The tensile strength and elongation at break of GMSF films in dry and wet state were determined using standard testing machine (Zwick), equipped with a 100 N capacity load cell. The test samples (3 × 2 cm) were mounted between grips of the machine and pulled at cross head speed of 10 mm/min . Average tensile properties of five specimens were measured.…”
Section: Methodsmentioning
confidence: 99%
“…The tensile strength and elongation at break of GMSF films in dry and wet state were determined using standard testing machine (Zwick), equipped with a 100 N capacity load cell. The test samples (3 × 2 cm) were mounted between grips of the machine and pulled at cross head speed of 10 mm/min . Average tensile properties of five specimens were measured.…”
Section: Methodsmentioning
confidence: 99%
“…The special nanostructure of BSF lm was studied in our previous study. 23 The BSF lm showed nanobrous structure originated from the nanobril-preservation dissolution behavior of broin in CaCl 2 /formic acid. The preserved nanobril endowed the BSF lm with exceptional mechanical properties.…”
Section: Morphologymentioning
confidence: 99%
“…Formic acid can be used to dissolve polyamides (e.g., nylon 66 and nylon 46) or silk to prepare fibers and membranes [81][82][83]. It is also a useful component in semiconductor cleaning solutions [84].…”
Section: Solvent Usementioning
confidence: 99%