Facile fabrication and tuning of TiO2 nanoarchitectured morphology using magnetron sputtering and its applications to photocatalysis

Lin, Zu-Bei; Lu, Wei; Wu, Chun Yi; Chang, Kao‐Shuo

doi:10.1016/j.ceramint.2014.07.025

Cited by 33 publications

(24 citation statements)

References 38 publications

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“…The growth mechanism is detailed in a previous report. 39 However, XRD analysis revealed an amorphous structure in the nanocolumn sample (Fig. 1b).…”

Section: Resultsmentioning

confidence: 97%

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Facile Fabrication of a Photocatalyst of Ta₄N₅Nanocolumn Arrays by Using Reactive Sputtering

Peng

Lee

Chang

2015

J. Electrochem. Soc.

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This paper reports a facile fabrication method for robust and separated polycrystalline Ta 4 N 5 nanocolumn arrays on a FTO/glass substrate that involves using reactive sputtering, which provides an alternative approach to fabricating nitrides without using caustic NH 3 gases. The bandgap of Ta 4 N 5 nanocolumns made at 600 • C was observed to be approximately 2.5 eV. The excellent photodegradation performance was demonstrated in an environment with a pH of 10, in which approximately 80% of methylene blue (5 ppm) was photodegraded in 90 min. The incident photon-to-current efficiency of the 600 • C sample showed equivalent or superior characteristics compared with the Ta 3 N 5 and IrO 2 /Ta 3 N 5 thin films reported in the literature. The photoelectrochemical current measurement also demonstrated the stability of the sample. These features suggest that Ta Photodecomposition of organic pollutants that entails using longlasting solar power is one of the most sustainable applications of photocatalysis, 1 in addition to photocatalytic water splitting for hydrogen (H 2 ) production.2,3 Although various semiconductors have been proposed for such applications, most of these semiconductors exhibited various problems and limitations; for example, PbS and CdS 4,5 are toxic and easily photocorroded in a solution; ZnO is photocorrosive 6 and difficult to synthesize using solution-based processes because of its low solubility in water;7 Fe 2 O 3 , SnO 2 , and WO 3 require additional power to trigger harvesting of H 2 because of the unsuitable conduction band edges. 8 TiO 2 has been the most studied photocatalyst, 9,10 but exhibits excellent photocatalytic activity only under ultraviolet (UV) irradiation because of its wide bandgap (approximately 3.2 eV for anatase and 3.0 eV for rutile 9 ). A desirable photocatalytic process should occur in the visible light range, which comprises the prevailing portion (approximately 43%) of the solar spectrum. 3,11Tantalum nitride, existing in various stable and metastable phases, 12,13 represents another promising material system because it exhibits various favorable properties. The microstructure, as well as the mechanical and electrical properties, can be modulated within a wide range, depending on the deposition techniques 14 and the stoichiometry of nitrogen. 19,[24][25][26] and photodecomposition of organic pollutants. In particular, Ta 3 N 5 has received considerable attention because of its advantageous band structure (E g ∼ = 1.5 eV-2.1 eV).19,27-30 Studies have typically synthesized Ta 3 N 5 by using a two-step approach; Ta 2 O 5 was first grown, and subsequent nitridation was employed to obtain Ta 3 N 5 in a moisturized NH 3 atmosphere. 25,[30][31][32][33] This method typically exhibited the poor control of film thickness and structural discontinuities during oxidation and nitridation. 31 Consequently, high defect densities of Ta 3 N 5 were attained, thus compensating the photoelectrochemical (PEC) performance. 34 In addition, the chemical and functional instability of Ta 3 N 5...

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“…The growth mechanism is detailed in a previous report. 39 However, XRD analysis revealed an amorphous structure in the nanocolumn sample (Fig. 1b).…”

Section: Resultsmentioning

confidence: 97%

“…Based on our experience in constructing nanocolumns, 39 a distance of 7 cm was used for fabricating the Ta 4 N 5 nanocolumn structures. The function of the FTO/glass substrate was to deposit the sputtered species nonuniformly on the rough surface (pyramids) for enhancing the growth of the columnar structure of Ta 4 N 5 .…”

Section: Resultsmentioning

confidence: 99%

Facile Fabrication of a Photocatalyst of Ta₄N₅Nanocolumn Arrays by Using Reactive Sputtering

Peng

Lee

Chang

2015

J. Electrochem. Soc.

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“…Por definição, uma superfície super-hidrofílica é aquela com alta energia superficial. Ela se caracteriza por apresentar um ângulo de contato menor que 10° entre a gota de água e a superfície (11,12) . Para as amostras com tratamento térmico em 500 °C a gota da água deionizada (5 µl) espalha-se mais sobre a superfície do vidro (Fig.…”

Section: Resultados E Discussõesunclassified

“…As amostras foram analisadas somente na posição C por apresentarem maior transparência. As amostras de TiO 2 sem tratamento apresentaram a fase rutile com textura formada pelos seguintes planos cristalinos: (110), (101), (111), (211) e (220) (localizados respectivamente a 27,0, 36,1, 42,5, 54,3 e 57,0 graus) (12,13,14) . Esta fase cristalina que pode ter sido favorecida pela energia fornecida ao filme durante seu crescimento, principalmente pelo bombardeamento de espécies energéticas e pela temperatura em que o substrato foi mantido durante o crescimento dos filmes (15) .…”

Section: Resultados E Discussõesunclassified

Molhabilidade de filmes de TiO2 Depositados sobre substratos de vidro soda-lime

Philippsen¹,

Tomiyama²,

Irala³

et al. 2017

RBAV

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Resumo AbstRActTitanium oxide films with thickness gradient were obtained from titanium target (purity 99.5%) by reactive deposition, using triode magnetron sputtering technique. The films were deposited on glass substrate and characterized by the following techniques:X-ray diffraction (XRD), water drop contact angle measurements (before and after UV radiation) and profilometer. After the film deposition, a set of samples were oxidized in atmosphere air at 500 °C, during one hour. It is notice that the film becomes transparent at thinner region. Results indicate that the contact angle, between water drop and TiO 2 films, reduces after post oxidation. Moreover, UV irradiation on film surface also reduces the contact angle, that is a well-known characteristic of TiO 2 .

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“…Currently, there are diverse techniques for the production and synthesis of these kind of materials, in bulk or particles like sol-gel [8,9], or in the form of coatings or thin films known as the chemical vapor deposition (CVD) [10,11] and physical vapor deposition (PVD) [13]. Some important CVD methods are the plasma assisted chemical vapor deposition (PECVD) [12] or the metal-organic chemical vapor deposition (MOCVD); On the other hand, PVD include several methods, one of them is the magnetron sputtering [14] in direct current (DC) [15] or radiofrequency (RF) [16] or a combination of both DC and RF known as co-sputtering [15,16].…”

Section: Introductionmentioning

confidence: 99%

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

et al. 2018

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Nanostructured TiO 2 and TiO 2 /W thin films were deposited on Corning glass substrates by RF and DC magnetron co-sputtering at room temperature, using three targets of TiO, Ti and W. After deposition, samples were subjected to an annealing treatment in air at 500 °C for 3 hrs. The effect of the annealing treatment and tungsten addition to the TiO 2 matrix were studied by Raman spectroscopy and X-ray diffraction. Morphology and composition was studied with field emission scanning electron microscopy and optical characterization was made with UV-Vis spectroscopy. All the obtained samples presented an amorphous TiO 2 phase; however, after the annealing treatment, a crystallization process from amorphous to anatase phase occurred with gain sizes between 15.6 and 18.3 nm, additionally, a small amount of rutile was also observable. The SEM images corroborated the XRD behavior, besides it was possible to calculate the thickness of the films which was greater for the W-doped films owing the extra power of the sputtering growth, and after the samples had the thermal treatment the thickness decreased due to a more organized structure. Finally, the UV-vis transmittance analysis revealed that the transmittance is higher in heat-treated films as compared to those without any thermal treatment; also, the TiO 2 thin films showed a greater transmittance than the W doped TiO 2 films, reaching 91%. The lack of transmittance in the non-thermal-treated films made it impossible to compute the band gap of the films; nevertheless, for the thermal-treated films the band gap had a minimal change to the classic TiO 2 bang gap value, even for the W doped sample, providing them with the benefits of the tungsten within the same TiO 2 structure due to a great homogenization on the structure.

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Facile fabrication and tuning of TiO2 nanoarchitectured morphology using magnetron sputtering and its applications to photocatalysis

Cited by 33 publications

References 38 publications

Facile Fabrication of a Photocatalyst of Ta₄N₅Nanocolumn Arrays by Using Reactive Sputtering

Facile Fabrication of a Photocatalyst of Ta₄N₅Nanocolumn Arrays by Using Reactive Sputtering

Molhabilidade de filmes de TiO2 Depositados sobre substratos de vidro soda-lime

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

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Facile fabrication and tuning of TiO2 nanoarchitectured morphology using magnetron sputtering and its applications to photocatalysis

Cited by 33 publications

References 38 publications

Facile Fabrication of a Photocatalyst of Ta4N5Nanocolumn Arrays by Using Reactive Sputtering

Facile Fabrication of a Photocatalyst of Ta4N5Nanocolumn Arrays by Using Reactive Sputtering

Molhabilidade de filmes de TiO2 Depositados sobre substratos de vidro soda-lime

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

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Facile Fabrication of a Photocatalyst of Ta₄N₅Nanocolumn Arrays by Using Reactive Sputtering

Facile Fabrication of a Photocatalyst of Ta₄N₅Nanocolumn Arrays by Using Reactive Sputtering