Resumo
AbstRActTitanium oxide films with thickness gradient were obtained from titanium target (purity 99.5%) by reactive deposition, using triode magnetron sputtering technique. The films were deposited on glass substrate and characterized by the following techniques:X-ray diffraction (XRD), water drop contact angle measurements (before and after UV radiation) and profilometer. After the film deposition, a set of samples were oxidized in atmosphere air at 500 °C, during one hour. It is notice that the film becomes transparent at thinner region. Results indicate that the contact angle, between water drop and TiO 2 films, reduces after post oxidation. Moreover, UV irradiation on film surface also reduces the contact angle, that is a well-known characteristic of TiO 2 .
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