2002
DOI: 10.1016/s0022-0248(02)01701-3
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Fabrication of ultra-high density InAs-stacked quantum dots by strain-controlled growth on InP(311)B substrate

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Cited by 135 publications
(92 citation statements)
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“…However, the tensile strain generated by the InAs Qdots is not compensated as the capping layer is normally lattice matched to the substrate material. This issue has been successfully addressed by Akahane et al using MBE growth technique who proposed and demonstrated a strain-compensation scheme [32]. The approach was based on adjusting the composition of the InGaAlAs spacer layers to have a smaller lattice constant than that of the InP substrate in order to achieve strain compensation after the growth of one cycle of Qdots and the spacer layer.…”
Section: Qdots On (311)b Inp Substratementioning
confidence: 99%
“…However, the tensile strain generated by the InAs Qdots is not compensated as the capping layer is normally lattice matched to the substrate material. This issue has been successfully addressed by Akahane et al using MBE growth technique who proposed and demonstrated a strain-compensation scheme [32]. The approach was based on adjusting the composition of the InGaAlAs spacer layers to have a smaller lattice constant than that of the InP substrate in order to achieve strain compensation after the growth of one cycle of Qdots and the spacer layer.…”
Section: Qdots On (311)b Inp Substratementioning
confidence: 99%
“…25 As buffer on an n-type InP(311)B substrate, where a high dot density and homogeneity, as well as a good rotational dot-symmetry can be achieved. [43][44][45] The samples feature an optically active layer of QDots with a nominal thickness of four to six monolayers (MLs) of InAs which is embedded between 150 nm thick In 0.53 Al 0.22 Ga 0.25 As barrier layers ( Fig. 1(a)).…”
Section: As Barriersmentioning
confidence: 99%
“…A multi-layer InAs QD structure was formed on InP(311)B based on MBE with a strain-compensation scheme. 31 As schematically shown in Fig. 1 obtained here.…”
Section: A Experimentsmentioning
confidence: 64%