2011
DOI: 10.1116/1.3646475
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Fabrication of two-dimensional tungsten photonic crystals for high-temperature applications

Abstract: Articles you may be interested inLarge-area fabrication of high aspect ratio tantalum photonic crystals for high-temperature selective emitters

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Cited by 30 publications
(32 citation statements)
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“…Studies of the influence of various fabrication imperfections show that in this case, the slight broadening of the cutoff and increase of the emissivity above the cutoff wavelength is mostly due to a slight tapering of the sidewalls. Sidewall disorder, i. e. random roughness of the cavity edge can be neglected due to our optimized dry etch process of the Cr hard mask, which allows for precise control of the cavity diameter and smooth edges as compared to a wet etch process (as previously used for W PhCs 24,25 ). Also, we ensured by Auger electron spectroscopy (AES) that there is no contamination from the Cr hard mask after removal of the etch mask, which would be detrimental to the desired low emissivity at long wavelengths.…”
Section: Recent Achievements: Tantalum Photonic Crystalsmentioning
confidence: 99%
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“…Studies of the influence of various fabrication imperfections show that in this case, the slight broadening of the cutoff and increase of the emissivity above the cutoff wavelength is mostly due to a slight tapering of the sidewalls. Sidewall disorder, i. e. random roughness of the cavity edge can be neglected due to our optimized dry etch process of the Cr hard mask, which allows for precise control of the cavity diameter and smooth edges as compared to a wet etch process (as previously used for W PhCs 24,25 ). Also, we ensured by Auger electron spectroscopy (AES) that there is no contamination from the Cr hard mask after removal of the etch mask, which would be detrimental to the desired low emissivity at long wavelengths.…”
Section: Recent Achievements: Tantalum Photonic Crystalsmentioning
confidence: 99%
“…Recent work on tungsten (W) photonic crystals 16,20,[22][23][24][25] for high temperature applications demonstrated very promising results regarding selective thermal emitters. In our most recent work however, we try to tackle some of the shortcomings of tungsten (e. g. W is extremely difficult to weld, impeding successful system integration) from a materials research point of view and broaden the range of substrate materials used for high temperature photonic applications, and demonstrate how the substrate and its properties can be tailored to meet to the specific needs of the application, including optical, mechanical, and thermo-mechanical properties.…”
Section: Recent Achievements: Tantalum Photonic Crystalsmentioning
confidence: 99%
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“…5,[19][20][21] The first method is expensive and limited in throughput and area; the second one is capable of exposing large areas, but is inherently limited to simple patterns such as square lattices of cylindrical cavities. In this study, nanoimprint lithography (NIL) was used as a high-throughput, high-resolution nanostructuring technique that allows for complex and dense patterns to be replicated from a master stamp with high reproducibility and uniformity over large areas.…”
mentioning
confidence: 99%
“…In the past, 2D PhCs for selective emitters and absorbers were fabricated on tungsten (W) and tantalum (Ta) substrates as well as TaW alloys [19][20][21] using electron-beam lithography (EBL) 7 or interference lithography (IL). 5,[19][20][21] The first method is expensive and limited in throughput and area; the second one is capable of exposing large areas, but is inherently limited to simple patterns such as square lattices of cylindrical cavities.…”
mentioning
confidence: 99%