Fabrication of two-dimensional InP-based photonic crystals by chlorine based chemically assisted ion beam etching

Abstract

Articles you may be interested inSmooth sidewall in InP-based photonic crystal membrane etched by N 2 -based inductively coupled plasma Two-dimensional photonic crystals ͑PhCs͒ were etched into InP/͑Ga,In͒͑As,P͒ planar waveguides using chlorine-based chemical assisted ion beam etching ͑CAIBE͒. The processed PhCs were optically characterized by measuring transmission through simple slabs and one-dimensional cavities. The optical performances inside the photonic band gap are much better compared to both previously reported CAIBE results and results obtained with other etching methods. In particular, we measured a record quality factor of 310 for one-dimensional cavities fabricated in this material system.

Comparative study of Cl2, Cl2∕O2, and Cl2∕N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

“…10,11 Also in this chemically assisted ion-beam-etching ͑CAIBE͒ technique, the etch depths strongly depend on hole diameter for diameters well below 1 m, as was shown in a recent systematic investigation. 12 Successful etching of deep photonic-crystal holes has also been accomplished by high-plasma-density RIE using ECR ͑Ref.…”

Liquid Crystals into Planar Photonic Crystals

“…Then, the current-voltage characteristics of the heterostructure were measured on two non-patterned samples, one of which was treated with HF to remove the residual SiO 2 over-layer that is usually deposited on the InP surface for the fabrication of planar PhCs (see Sect. 3.1;Mulot et al, 2004). The results of these measurements are reported in Fig.…”

“…electric field perpendicular and parallel to the hole axis, respectively: see Fig. 5a) and the effective refractive indexes n eff for both the TE and the TM guided modes varies linearly with temperature Ferrini et al, 2004;Mulot et al, 2004;Martz et al, 2005;Ferrini et al, 2006;El-Kallassi et al, 2007). The internal light source (ILS) technique was used to optically characterize the infiltrated PhC structures (Ferrini et al, 2002b).…”

Photonic Crystals—A Step towards Integrated Circuits for Photonics

“…[97] Notably, etch depths in excess of 4 mm have recently been demonstrated. [98] 4.5. Choice of Materials for Two-Dimensional Photonic Crystals: General Considerations For active PhC devices, appropriate materials that can emit light at the desired wavelengths have to be used, which implies direct bandgap group III-V semiconductors.…”