2013
DOI: 10.1016/j.mee.2012.08.025
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Fabrication of two-dimensional hard X-ray diffraction gratings

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Cited by 41 publications
(28 citation statements)
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“…The grating pattern was produced by electron-beam writing into a resist layer and then transferred into the 300 μm thick silicon substrate by reactive ion etching [20]. For the setup described, grid-to-detector distance D 7.29 cm, 21.87 cm, 36.45 cm, and so on.…”
mentioning
confidence: 99%
“…The grating pattern was produced by electron-beam writing into a resist layer and then transferred into the 300 μm thick silicon substrate by reactive ion etching [20]. For the setup described, grid-to-detector distance D 7.29 cm, 21.87 cm, 36.45 cm, and so on.…”
mentioning
confidence: 99%
“…If the metallic glass material has already crystallized, the mask surface can still be treated with an Arion milling machine. Furthermore, by separation of the Si mold from the absorbing septa through an etching process or thinning the Si mold, as described in previous studies, 23,32 it would be possible to eliminate another source of extra absorption. …”
Section: Resultsmentioning
confidence: 99%
“…20 A number of techniques have been proposed to fabricate x-ray absorption gratings/masks as well as increase their performance, most of which were through the Lithography, Electroplating, and Molding (LIGA) process. [21][22][23][24] They have mainly attempted to increase the height to pitch ratio (aspect ratio) or field of view of gratings but realizing both goals at the same time has posed severe difficulties. [25][26][27][28][29] In fact, the smaller the pitch of these gratings, the more the fabrication process becomes difficult in electroforming since achieving a uniform and relatively defect-free pattern requires considerable time and cost.…”
Section: Introductionmentioning
confidence: 99%
“…This is done by a procedure called phase stepping, where G 2 is usually scanned for one or more periods of the interference fringe and images are acquired at each step. This configuration allows to decouple the detector resolution from the grating pitch but relies on the fabrication of high aspect ratio metal structures (G 2 ) 14,18 and further reduces the flux and dose efficiency, which is crucial for medical applications due to the additional photon loss after the sample. Therefore, a technique based only on phase shifting elements is favourable.…”
mentioning
confidence: 99%