Fabrication of three-dimensional structures of resist by proton beam writing

Abstract

Articles you may be interested inNote: Proton microbeam formation with continuously variable kinetic energy using a compact system for threedimensional proton beam writing Rev. Sci. Instrum. 86, 036102 (2015); 10.1063/1.4915319Application of proton beam writing for the direct etching of polytetrafluoroethylene for polydimethylsiloxane replica moldingThe fabrication of three-dimensional ͑3D͒ structures was demonstrated by proton beam writing ͑PBW͒ using a MeV light-ion microbeam system at Japan Atomic Energy Agency. The fabrication of the 3D structures was performed using PBW in a thick SU-8 layer with a thickness of up to 50 m, which is a typical negative resist. The authors exposed the negative resist on a silicon substrate to focused MeV proton beams within 1 m in diameter, using two different beam energies to obtain two different depths in the resist aiming at fabrication of 3D structures. The two different beam energies were obtained using a 75 m Kapton film as a beam energy degrader to generate 1.6 MeV proton beam from 3.0 MeV, or using the accelerator voltage control in order to produce beam energy of 1.2 MeV. The 3D lines and space structures with the same shape were fabricated using the two different methods. An Arc de Triomphe shape was also manufactured to demonstrate the superior and unique features of the PBW as a versatile tool for deep micromachining for 3D structures with high aspect ratio.

Irradiation Facilities of the Takasaki Advanced Radiation Research Institute

“…Since the scattering of protons with energy on the order of MeV is suppressed, compared with electrons, the PBW is a promising technique for the micro-machining of structures with a high aspect ratio [37]. Moreover, threedimensional structures, such as an arch, can be fabricated by changing the beam energy and range [38]. Figure 17.…”

Resist evaluation for Ni mold fabrication and proton beam writing

“…Proton beam writing (PBW) is a promising new direct-write lithographic technique which employs a focused MeV proton beam to pattern suitable resists [1,2]. The process, although similar in many ways to direct writing using electrons, nevertheless offers some interesting and unique advantages.…”

Versatile proton beam writing system with stage movement

“…In addition, the acceleration energy controllable property is another unique advantage of proton beam technique which enables to change the acceleration energy in the order to obtain the different penetration ranger. Consequences of these advantages make PBW a versatile tool for micro fabrication, in particular for the structures which need high aspect ratio, smooth and straight side wall, and complicated 3D profile [5] [6].…”