Fabrication of Suspended Silicon Nanowire Arrays

Abstract

A method to fabricate suspended silicon nanowires that are applicable to electronic and electromechanical nanowire devices is reported. The method allows for the wafer-level production of suspended silicon nanowires using anisotropic etching and thermal oxidation of single-crystal silicon. The deviation in width of the silicon nanowire bridges produced using the proposed method is evaluated. The NW field-effect transistor (FET) properties of the device obtained by transferring suspended nanowires are shown to be practical for useful functions.

Fabrication of Metal Nanobridge Arrays using Sacrificial Silicon Nanowire

“…The fabrication process of silicon nanowire bridge for the template is straightforward. [10,11]. Fig.…”

Measurements of serum C-reactive protein levels in patients with gastric cancer and quantification using silicon nanowire arrays

“…9 Briefly, single crystalline substrates, including a p-type substrate characterized by 0.01-0.02 Ω-cm, an n-type substrate characterized by 10-30 Ω-cm, and an n-type (100)-oriented substrate, were treated with thermal oxidation, followed by etching with stepper photolithography. Silicon bulk anisotropic etching ( Figure 1, A and B), using deep silicon reactive-ion etching and potassium hydroxide (KOH) solutions in sequence, provided a triangular shape in cross-section and silicon posts with triangular cross-sections (Figure 1, C).…”

“…Recently, we reported a method for fabricating SiNWs suitable for mass production and on the feasibility of their use in biological applications. 9,10 This early work described the overall microelectromechanical systemsbased SiNW fabrication process for highly ordered SiNW arrays, including a transfer method for moving fabricated SiNWs onto other substrates and the feasibility of using semiconducting SiNWs as biosensors for the immunodetection of C-reactive protein (CRP). CRP, which is normally found in plasma, is synthesized by hepatocytes.…”

Fabrication and Evaluation of Silicon Nanowire Photodetectors on Flexible Substrate for Retinal Prosthetic System

“…First, a p-type silicon nanowire array is fabricated by the top-down process involving photolithography, silicon dry etching, anisotropic wet etching, and thermal oxidation [20]. A boron-doped (100)-oriented silicon substrate is prepared, a 1000-Å-thick thermal oxide is grown by a wet oxidation process (Fig.…”