2020
DOI: 10.1038/s41598-020-65901-5
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Fabrication of superconducting niobium nitride nanowire with high aspect ratio for X-ray photon detection

Abstract: The niobium nitride (NbN) nanowires fabricated with the high-quality ultra-thin NbN film with a thickness of 3 nm-6 nm were widely used for single photon detectors. These nanowires had a low aspect ratio, less than 1:20. However, increasing the thickness and the aspect ratio of highly-uniformed NbN nanowires without reducing the superconductivity is crucial for the device in detecting high-energy photons. In this paper, a high-quality superconducting nanowire with aspect ratio of 1:1 was fabricated with optimi… Show more

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Cited by 8 publications
(7 citation statements)
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“…Third, a finely focused e-beam is utilized to scan the resist and trigger cross-linking or degradation reactions with respect to negative or positive resist. Then, the resist is developed to desired patterns by selective dissolution in specific developer solvents. , After that, the RIE process using SF 6 , CF 4 , CHF 3 , HBr, BCl 3 , or SiCl 4 as reactive gas , is applied to etch the exposed part of the thin film, while the film beneath the resist is retained. Finally, the desirable patterns are obtained after the residual resist lift off process.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Third, a finely focused e-beam is utilized to scan the resist and trigger cross-linking or degradation reactions with respect to negative or positive resist. Then, the resist is developed to desired patterns by selective dissolution in specific developer solvents. , After that, the RIE process using SF 6 , CF 4 , CHF 3 , HBr, BCl 3 , or SiCl 4 as reactive gas , is applied to etch the exposed part of the thin film, while the film beneath the resist is retained. Finally, the desirable patterns are obtained after the residual resist lift off process.…”
Section: Resultsmentioning
confidence: 99%
“…Typical conventional EBL fabrication processes include thin film growth, resist coating, e-beam exposure, resist development, and reactive ion etching (RIE). ,,, In the overall process, lithography applies a focused electron beam to scan the resist (e.g., poly­(methyl methacrylate) and hydrogen silsesquioxane), the developing process utilizes specific developers to create nanoscale patterns in the resist, and RIE transforms the resist patterns to a thin film . Generally, both the development and RIE processes involve harmful organics (e.g., methyl isobutyl ketone, N -methylpyrrolidone, and acetone) or toxic gases (e.g., CF 4 , SF 6 , CHF 3 , HBr, BCl 3 , and SiCl 4 ), which not only harm the environment and humans but also damage the quality of the samples, especially in the field of producing micro/nanodevices. , …”
Section: Introductionmentioning
confidence: 99%
“…The dominant source of junction resistance non-uniformity is junction area variation 22 . The deviation of the mask feature size could be minimized by optimizing e-beam lithography (EBL) process 30 , 31 . There is typically a large junction wiring area (1–25 μm 2 ) leading to significant backscattering exposure of Dolan bridge during EBL.…”
Section: Experimental Overviewmentioning
confidence: 99%
“…NbN, being an excellent superconductor, is considered as one of the most commonly preferred materials in the electronic industry. [203][204][205][206][207][208] NbN can be used in diversified areas such as biomedical, [196,209,210] fuel cells, [211,212] cutting tools, [213] optical industry, [214,215] diffusion barriers, [197] thermometry, [216,217] supercapacitors, [218] cryogenics, [219,220] etc. Nonetheless, it can also be considered as a nonconventional material for cutting tool protective coatings due to its better combined thermal and mechanical properties than TiN.…”
Section: Applications Of Nbn Thin Filmsmentioning
confidence: 99%