“…Each ripple pattern shown in Figure is created in a single step, with a high degree of repeatability, without requiring any special environment and dedicated instrumentation. On the contrary, creating three-dimensional patterns with sub-micrometer features requires high-end equipment, such as electron-beam lithography (EBL), in conjunction with multiple “masking-etching-writing” steps. , Furthermore, the features sizes, e.g., depth and width of trenches as well as the adjoining hills, can be varied over orders of the length scales (e.g., the trench width of hundreds of nanometers to tens of micrometers), and the patterns can be created over larger distances (e.g., a few micrometers to a few centimeters). Given this versatility and the potential application of these structures in the diverse fields of optics, sensing, microfluidics, die-printing, etc., , we conduct this study to understand the mechanism of the formation of ripples.…”