Fabrication of Si microstructures using focused ion beam implantation and reactive ion etching

Abstract

Localized Ga implantation by means of a focused ion beam and subsequent deep reactive ion etching is used to fabricate microstructures or nanostructures in Si. It is found that the area irradiated with the focused ion beam acts as an etch stop in reactive ion etching. The etch rate ratio between the unimplanted and Ga-implanted area increases to 2.56 with an increasing Ga ion dose up to 1.59 × 10 16 ions cm −2 . However, the etch rate ratio decreases with further increase in ion dose and the surface of the etched Si microstructures is concave due to the effect of ion sputtering during focused ion irradiation. This technique is promising for the fabrication of 3D nanostructures in Si.

Numerical Simulation of Non-Ablative Laser Texturing of Silicon Surface with a Continuous Wave Fiber Laser

“…We summarize our observation as follows and will attempt to explain the phenomena by numerical method: (1) No discernible change was found on surface irradiated using the lowest power of 11.5 W.…”

Fabrication of complementary metal-oxide-semiconductor integrated nanomechanical devices by ion beam patterning

“…Previous works reported the use of FIB Ga + exposure as a mask for wet etching of silicon, 19-21 and very recently it has shown its efficiency as a mask for RIE. 22,23 The AFM image of Fig. 3͑a͒ shows a pattern realized by irradiating the silicon surface with a dose of 1.6ϫ 10 11 ions/ cm for the lines and 1.6ϫ 10 16 ions/ cm 2 for the areas.…”

Focused Ion Beam Nanoscale Patterned Transmission-Enhanced Fiber-Optic Tips

“…20 21 FIB has its strength in one-step maskless simpler, more flexible, and better-controlled nano-precision machining, patterning and fabrication especially for various submicron or nanoscale functional samples or devices via ion beam induced milling, etching and deposition due to its advantages of large depth of focus, high resolution, patterning flexibility, and direct-writing capability. [20][21][22][23][24][25][26][27][28][29][30][31][32][33][34] In addition, another advantage of FIB is that it can be conveniently used to machine the biology to analyze its nanophotonic structures, 35 and FIB nanopatterning can be further used to fabricate the designed nanoscale devices inspired by the observed biophotonic structures. So far, although FIB has been widely used for nanopatterning and nanofabrication for some nanodevices/nanostructures, only a few literatures regarding FIB nanopatterning on the metallically-coated flat-top fiber endfaces can be referred to, and these fiber endface nanostructures were actually fabricated on the cleaved coarse fiber tips, 1 16-18 i.e., the used fiber tip diameters were equal to the optical fiber diameters instead of the thinner tapered/angled fiber tips.…”