2014
DOI: 10.1166/jctn.2014.3316
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Numerical Simulation of Non-Ablative Laser Texturing of Silicon Surface with a Continuous Wave Fiber Laser

Abstract: Silicon is highly transparent to the infrared wavelength, so fiber laser with wavelength of 1090 nm is not regarded as a suitable tool for the purpose of ablation based surface texturing. However, we demonstrate, through finite element thermal analyses of laser irradiated surface, non-ablative texturing of Si surface is possible if suitable laser power and dwell time are used to produce peak temperatures above 1250 K and below the Si melting point of 1690 K. Localized oxidation occurs in the temperature range … Show more

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Cited by 7 publications
(4 citation statements)
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“…Another approach to texturing Si surface is by laser-induced surface oxidation (Farrokhi et al, 2012(Farrokhi et al, , 2014. This nonablative laser texturing method was successfully achieved using a continuous wave fiber laser to produce regular arrays of submicron bumps on a silicon surface, as shown in Figure 10.17.…”
Section: Laser Micromachining Silicon Surface For Replication On Polymentioning
confidence: 99%
“…Another approach to texturing Si surface is by laser-induced surface oxidation (Farrokhi et al, 2012(Farrokhi et al, , 2014. This nonablative laser texturing method was successfully achieved using a continuous wave fiber laser to produce regular arrays of submicron bumps on a silicon surface, as shown in Figure 10.17.…”
Section: Laser Micromachining Silicon Surface For Replication On Polymentioning
confidence: 99%
“…During the isotropic acid etching process, because of poor controllability and repeatability in reaction process [2,3].It was disadvantage of the development of new acid etching liquid and scale production, and the emergence of the computer simulation technology has important significance for optimizing the texturing process and reducing the production cost. At present, it is few about simulation results of crystal silicon texture, Several researchers mainly focus on the numerical calculation of surface reflectance [4,5]. Although the author had systematically studied different morphology of polysilicon texture for single model [6,7], in order to obtain more accurate optical characteristic of polysilicon texture, the truth polysilicon surface texture model were needed for further research, which lays a theoretical foundation for mastering the formation mechanism of crystalline silicon texture.…”
Section: Introductionmentioning
confidence: 99%
“…14 Illustration of Si surface irradiation model for thermal analysis. O, center point of the Si surface; X and Y, the 2D coordinate axis[145].…”
mentioning
confidence: 99%
“…17 Map of laser power vs dwell time obtained through simulation,showing the effective oxidation zone to produce regular bumps on Si surface[145].…”
mentioning
confidence: 99%