2003
DOI: 10.1116/1.1627814
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Fabrication of sawtooth diffraction gratings using nanoimprint lithography

Abstract: High fidelity blazed grating replication using nanoimprint lithographyWe report a process which integrates interference lithography, nanoimprint lithography, and anisotropic etching to fabricate replicated diffraction gratings with sawtooth profiles. This new process greatly reduces grating fabrication time and cost, while preserving the groove shape and smoothness. Relief gratings with 400 nm period inverted triangular profiles and 200 nm period gratings with 7°blaze angle were replicated from silicon masters… Show more

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Cited by 43 publications
(34 citation statements)
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“…We observe very good feature preservation in the replica with SEM and AFM and no obvious release damage. 19 Recent x-ray diffraction efficiency measurements on our first replicas (coated with Cr/Au) gave very promising results. 21 Some of the questions that need to be answered in the future are how well the features in the master are being replicated, how many good replicas can be made from a single master, and what kind of in-and out-of-plane distortions appear and can be tolerated when replicating larger area gratings.…”
Section: X-ray Energymentioning
confidence: 91%
See 1 more Smart Citation
“…We observe very good feature preservation in the replica with SEM and AFM and no obvious release damage. 19 Recent x-ray diffraction efficiency measurements on our first replicas (coated with Cr/Au) gave very promising results. 21 Some of the questions that need to be answered in the future are how well the features in the master are being replicated, how many good replicas can be made from a single master, and what kind of in-and out-of-plane distortions appear and can be tolerated when replicating larger area gratings.…”
Section: X-ray Energymentioning
confidence: 91%
“…Before patterning the wafer is covered with silicon nitride and a bi-level resist layer, consisting of anti-reflection coating (ARC) and photoresist. 19 The grating lines are parallel to the [110] direction. After transferring the grating pattern into nitride the substrate is etched in KOH, which anisotropically etches in the direction parallel to the (111) planes, potentially resulting in atomically smooth facets at the desired blaze angle.…”
Section: Fabrication Of Blazed Gratings For the Off-plane Geometrymentioning
confidence: 99%
“…The gratings are 100 mm long in the axial direction and 85 mm wide in the dispersion direction. The blaze is obtained by etching down to the <111> crystal plane of a Si wafer 6,18 . The gratings are aligned within modules which are subsequently aligned and mounted to the petal.…”
Section: Optics and Optical Designmentioning
confidence: 99%
“…Thus, the nitride mask ensures that the original groove density and radial pattern is replicated on the silicon substrate while the KOH etch serves to sculpt an atomically smooth, blazed groove profile. This technique of using a nitride mask and a KOH wet etch has been previously used to produce blazed gratings (Chang et al 2003). The nitride strips are then removed with a hydrogen The OGRE g graze angle o should be ma approximatel achievable us actuators (Al…”
Section: Gratings For the Off-plane Mountmentioning
confidence: 99%