Fabrication of patterned magnetic nanodots by laser interference lithography

Murillo, R.; Wolferen, H. A. van; Abelmann, Léon; Lodder, J.C.

doi:10.1016/j.mee.2005.01.004

Cited by 57 publications

(40 citation statements)

References 14 publications

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“…Magnetic nanostructures, often called "nanomagnets," have been proposed as an alternative technology for information storage [258,259]. In this application, discrete nanomagnets with uniaxial magnetic anisotropy store binary information when magnetized in one of two possible antiparallel directions.…”

Section: Magnetic Nanostructuresmentioning

confidence: 99%

“…In this application, discrete nanomagnets with uniaxial magnetic anisotropy store binary information when magnetized in one of two possible antiparallel directions. To generate these magnetic nanostructures, interference lithography has been used to generate a nanoscale array of dots that are, in turn, transferred to a magnetic film using ion beam etching as depicted in Figure 13(a) [258,259]. Others have employed interference lithography in the fabrication of cobalt magnetic arrays for use in magnetic random access memory devices as depicted in Figure 13(b) [260].…”

Section: Magnetic Nanostructuresmentioning

confidence: 99%

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Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

Burrow

Gaylord

2011

Micromachines

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Abstract:Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the micro-and nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials using multi-beam interference lithography (MBIL) to accomplish subwavelength patterning. Advances in MBI and MBIL and a very wide range of applications areas including nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures are reviewed and put into a unified perspective.

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Section: Magnetic Nanostructuresmentioning

confidence: 99%

Section: Magnetic Nanostructuresmentioning

confidence: 99%

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

Burrow

Gaylord

2011

Micromachines

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“…is a CoNi/Pt multilayer patterned by laser interference lithography with a periodicity down to 75 nm [4]. The read-write mechanism is based on a magnetic force microscope scanning the dot pattern ( direction).…”

Section: Magnetic Recording Setup and Simulationsmentioning

confidence: 99%

Two-Dimensional Coding for Probe Recording on Magnetic Patterned Media

Groenland

Abelmann

2007

IEEE Trans. Magn.

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The effect of intertrack intersymbol interference in a magnetic patterned medium is studied. A 2-D channel code is proposed, dedicated to perpendicularly magnetized media without soft underlayer, which exhibit read pulses showing overshoot. Read pulse shapes were investigated using a magnetic-force microscope tip scanning the patterned medium row by row. To test different codes, a bit-detection simulation program was developed to generate large amounts of data on which bit error rates can be measured. Application of the 2-D channel code, which implies recording of particular dot positions with fixed bits ("ones," "zeros") resulted in the elimination of 2-D worst case bit patterns and a subsequent reduction of detected-bit errors. The accompanying redundancy of 22% is inevitable for this type of 2-D code.Index Terms-Intertrack interference, magnetic force microscopy (MFM), patterned media, perpendicular magnetic recording, twodimensional coding.

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“…8 Although this value is far beyond the capability of our LIL system, the technique has already been used by us for the investigation of patterned magnetic media, applying a cost efficient 266 nm deep-UV laser and standard i-line resists. 9 This lithographic system provides a relatively cheap setup for the fabrication of nanoarrays surpassing the aforementioned restrictions of EBL with LIL exposure throughput times of about a minute or even less per in. 2 , with dot pattern periods and diameters at the length scale of interest, for the investigation of patterned magnetic media data storage.…”

Section: Introductionmentioning

confidence: 99%

“…2 , with dot pattern periods and diameters at the length scale of interest, for the investigation of patterned magnetic media data storage. 9 To expand this recent work towards lateral dimensions at sub-50-nm, we introduce, here, a new chemical amplified positive tone resist ͑p-CAR͒ exposed by the Lloyd mirror interferometer setup. The optical arrangement is installed at the MESA+ NanoLab, which allows us to carry out nanopatterning in a class 1000 cleanroom facility with a theoretical resolution limit producing lines and spaces at a pattern period of 133 nm ͑ / 2͒.…”

Section: Introductionmentioning

confidence: 99%

Laser interferometric nanolithography using a new positive chemical amplified resist

Lüttge

Wolferen

Abelmann

2007

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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The authors report on the progress of laser interference lithography at 266nm laser wavelength with a chemical amplified resist containing a polyvinyl derivate dissolved in propylene glycol monoethyl ether ester. A continuous-wave deep-UV source combined with a Lloyd mirror is a simple and useful tool for the fabrication of nanoscale periodic structures generally called nanoarrays. Aiming for a robust pattern transfer technique to fabricate nanoarrays into magnetic materials, the authors investigated the utility of a chemical amplification positive tone resist, despite the relatively high theoretical resolution limit of 133nm (λ∕2) pattern period for the laser source used. Taking advantage of this new type of resist, the authors demonstrated for the first time the fabrication of an 18Gbit∕in.2 dot pattern on a platinum thin film.

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Fabrication of patterned magnetic nanodots by laser interference lithography

Cited by 57 publications

References 14 publications

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

Two-Dimensional Coding for Probe Recording on Magnetic Patterned Media

Laser interferometric nanolithography using a new positive chemical amplified resist

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