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2019
DOI: 10.1016/j.matpr.2019.06.233
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Fabrication of Nanorods-TiO2 for Heterojunction Thin Film Application with Electrodeposit-p-Cu2O Absorbing Layer

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Cited by 3 publications
(1 citation statement)
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“…An aqueous solution containing 0.4M copper (II) acetate monohydrate (Cu(Ac)2.H2O, Kanto Chemical Co. Inc., purity: 99.0%) and 3.0M lactic acid (CH3CH(OH)COOH, Kanto Chemical Co. Inc., 85.0 -92.0%) solution at a bath temperature of 60 °C as shown in Figures 7 and 8, respectively. The electrodeposition potential was −0.4 V and pH 12.5 was adjusted with the help of 4M potassium hydroxide (KOH, Kanto Chemical Co. Inc., purity: 86.0%) [13]. After the deposition took place, the sample was rinsed with deionized water to remove the remaining chemical solutions, dried in air.…”
Section: Preparation Of Cu2o Film On Tio2 Nanorodsmentioning
confidence: 99%
“…An aqueous solution containing 0.4M copper (II) acetate monohydrate (Cu(Ac)2.H2O, Kanto Chemical Co. Inc., purity: 99.0%) and 3.0M lactic acid (CH3CH(OH)COOH, Kanto Chemical Co. Inc., 85.0 -92.0%) solution at a bath temperature of 60 °C as shown in Figures 7 and 8, respectively. The electrodeposition potential was −0.4 V and pH 12.5 was adjusted with the help of 4M potassium hydroxide (KOH, Kanto Chemical Co. Inc., purity: 86.0%) [13]. After the deposition took place, the sample was rinsed with deionized water to remove the remaining chemical solutions, dried in air.…”
Section: Preparation Of Cu2o Film On Tio2 Nanorodsmentioning
confidence: 99%