Characterization: XRD patterns were recorded on a Scintag diffractometer operated at 35 kV voltage and 30 mA current with Cu Ka radiation (k = 1.54178 ). SEM images were taken on a Hitachi S-3500N scanning electron microscope. TEM images were obtained with a Philips 420 transmission electron microscope with an accelerating voltage of 120 kV. HRTEM micrographs, SAED patterns, and EDS spectra were taken on a JEOL-20l0F transmission electron microscope operated at 200 kV. [1±4] fabricating biological and chemical sensors, [5,6] and controlling crystallization. [7,8] Existing elegant approaches involving lithography, imprint, and soft lithography techniques have been successfully applied for creating patterned surfaces in microelectronics and plastic electronics.
Received[9±20] In particular, imprinting is an interesting approach because of its scalable, parallel, cost-effective, and promising low-cost device applications. Meanwhile, high-resolution templates and simpler patterning processes are becoming more attractive for mesoscale imprinting and patterning multilayered hybrid films. As we know, three-dimensional colloidal crystals, the versatile templates and scaffolds, have prompted a creative surge in threedimensionally structured materials such as photonic bandgap materials and multiporous materials.[21±27] However, three-dimensional colloidal crystals, to the best of our knowledge, have not been used as templates for mesoscopic imprinting and patterning. Recently, we reported that three-dimensional colloidal crystals could be intentionally utilized to fabricate two-dimensional mesoscopic arrays and self-assembled monolayers via the ªcolloidal-crystal-assisted capillary nanofabricationº (CCACN) method.[28] However, there are limitations for patterning hybrid multilayered structures and fabricating hierarchical patterns using CCACN, ªmicromolding in capillariesº (MIMIC), [29] ªmicrofluidic networkº (lFN), [30,31] micro/nanosphere lithography, [2,17,32,33] and controllable wetting approaches.[34±37]The colloidal-crystal-assisted imprint (CCAIP) approach is generally applicable: it develops a parallel mesoscopic surface fabrication or imprinting approach and also facilitates threedimensional colloidal crystals to generate meso-and even COMMUNICATIONS