2005
DOI: 10.1021/nl051932+
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Fabrication of Metallic Nanodots in Large-Area Arrays by Mold-to-Mold Cross Imprinting (MTMCI)

Abstract: We have developed a mold-to-mold cross imprint (MTMCI) process, which redefines an imprint mold with another imprint mold. By performing MTMCI on two identical imprint molds with silicon spacer nanowires in a perpendicular arrangement, we fabricated a large array of sub-30-nm silicon nanopillars. Large-area arrays of Pt dots are then produced using nanoimprint lithography with the silicon nanopillar mold.

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Cited by 37 publications
(32 citation statements)
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“…compressibility, liquid-gas transitions critical parameters) at large pressures on microporous silica gels [14][15][16][17] and powders, [18] as well as recent studies on the liquid-silica interface [19]. Single-crystal silica surfaces are conveniently used as supports to grow a variety of nanostructures such as nanotubes, [20,21] model array catalysts, [22,23] and metal-on-support model catalysts [24,25]. Combining nanotechnology and surface science techniques towards catalysis applications currently attracts significant interest [26].…”
Section: Introductionmentioning
confidence: 99%
“…compressibility, liquid-gas transitions critical parameters) at large pressures on microporous silica gels [14][15][16][17] and powders, [18] as well as recent studies on the liquid-silica interface [19]. Single-crystal silica surfaces are conveniently used as supports to grow a variety of nanostructures such as nanotubes, [20,21] model array catalysts, [22,23] and metal-on-support model catalysts [24,25]. Combining nanotechnology and surface science techniques towards catalysis applications currently attracts significant interest [26].…”
Section: Introductionmentioning
confidence: 99%
“…Another new method we developed for the fabrication of catalytic nanodots is called mold-to-mold cross imprint (MTMCI) [4]. This technique is capable of producing high areal density nanodots of any metal on any surface.…”
Section: Formation Of 2-d Nanocatalyst By Nanolithographymentioning
confidence: 99%
“…The field of metal heterogeneous catalyst developed rapidly by use of model catalyst, first single crystal surface [1], then monodispersed nanoclusters deposited on oxide surface by lithography techniques [2][3][4][5][6][7] or by colloid chemistry [8][9][10][11][12]. While single crystal could reproduce many of the elementary steps of industrial catalytic reactions where there is only one product (quinoline synthesis, carbon monoxide oxidation, and ethylene hydrogenation), for multi-path reaction with several reaction products the selectivity depends on ingredients such as the oxide-metal interface and the presence of a second metal that selectively blocks surface sites.…”
Section: Introductionmentioning
confidence: 99%
“…EUV lithography using a short wavelength of 13.5 nm and 0.3-NA exposure tool has also enabled the printing of 22 nm half-pitch lines (Naulleau et al, 2009). On the other hand, attractive patterning techniques, such as a superlattice nanowire pattern transfer (SNAP) method (Melosh et al, 2003;Green et al, 2007), a mold-to-mold cross imprint (MTMCI) process (Kwon et al, 2005) and a surface sol-gel process combined with photolithography (Fujikawa et al, 2006), are currently proposed and pursued actively. The SNAP method, which is based on translating thin film growth thickness control into planar wire arrays, has enabled the production of molecular memories consisting of 16 nm wide titanium/silicon nanowires.…”
Section: Introductionmentioning
confidence: 99%