Fabrication of metallic microstructure on curved substrate by optical soft lithography and copper electroplating

Park, Jongho; Fujita, Hiroyuki; Kim, Beomjoon

doi:10.1016/j.sna.2011.03.024

Cited by 30 publications

(20 citation statements)

References 27 publications

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“…PDMS flexible photomask was then attached on SU-8 film. The details of fabrication process of PDMS photomask are described in the previous work [6]. PDMS photomask has 4 different shaped patterns which include line, cross, square, and circle shapes.…”

Section: Methodsmentioning

confidence: 99%

“…The PDMS roller stamp was rolled against the flat substrate. After roll contact printing was performed, the substrate was etched in the ferri/ferro cyanide etching solution (KOH: 1 M, Na 2 S 2 O 3 : 100 mM, K 3 Fe(CN) 6 : 10 mM, K 4 Fe(CN) 6 : 1 mM [9]) after the printing.…”

Section: Methodsmentioning

confidence: 99%

“…To overcome those difficulties, several techniques for micropatterning with nonplanar substrates have been developed, which include laser lithography [3], photolithography with customized exposure module [4], decal transfer lithography [5], and so on. Recently, the optical soft lithography technique was successfully introduced to fabricate micro patterns onto a curved substrate [1,6]. Instead of a rigid glass photomask, a flexible PDMS photomask was used, which can be fit uniformly along a curved substrate.…”

Section: Introductionmentioning

confidence: 99%

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Fabrication of 3D Micro Structures on Nonplanar Substrates and Its Applications for Roll Micro contact Printing

2012

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The purpose of this research is to develop a fabrication technique of microstructures on nonplanar substrates, investigating so called, optical softlithography. In addition, PDMS roller stamps were duplicated from these structures on curved substrates as the mold, roll micro contact printing was performed successfully.Micro structuring on nonplanar substrates has not been fully established yet, although several fabrication methods, such as laser direct writing and modified photolithography, were proposed. Moreover, those techniques require still expensive and complex processes. To overcome those drawbacks, optical softlithography using flexible photomasks was developed [1]. Firstly, SU-8 micro structures were fabricated on concave substrates by optical softlithography using PDMS flexible photomasks. As a result, SU-8 structures with 2.5 µm line width and high aspect ratio over 7.9 were fabricated on a concave substrate. Also, experimental parameters for optical softlithography were investigated and established for further fabrications and applications. In addition, the tilting structures were confirmed due to the vertical UV exposure method.Next, Based on these novel 3D patterning technologies, PDMS roller stamps were fabricated and roll micro contact printing was performed. The roll micro contact printing was investigated by using the customized roll micro contact printing apparatus and the flexible pressure sensor system. We expect this technique can provide various sized roller stamps with various micro patterns for µCP process as well as roll micro contact printing process.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Fabrication of 3D Micro Structures on Nonplanar Substrates and Its Applications for Roll Micro contact Printing

2012

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“…We propose a novel 3-D surface patterning method for PMMA [193], which is based on the thermo-/chemo-responsive SME in PMMA. This method is simpler and easier to implement as compared with many existing methods, such as lithography, self-assembly and imprinting [208][209][210][211], and has the advantage of precise control of the patterned area, which is lack of in current wrinkling based patterning methods [198]. Since PMMA is a conventional optical polymer, this method is potentially applicable to fabricate 3-D artificial compound eye (insect eye) in optics applications.…”

Section: Patterning Atop Curved Substratementioning

confidence: 99%

Shape memory technology : working mechanisms, modeling and surface patterning application

Zhao¹

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A new way to classify shape memory materials (SMMs) was proposed based on the underlying working mechanisms behind the shape memory effect (SME). Three categories, namely dual-state mechanism, dual-component mechanism, and partial-transition mechanism, were discussed in details. Based on this, the concept of advanced shape memory technology was proposed to enable the SME in materials, to design/synthesize new SMMs with tailored features, and to optimize the SME in materials. Previously, SME is considered as a unique behavior in some certain materials. In this study, based on ASMT, SME can be achieved in a range of materials, which are not the traditional SMMs. A generic 3-D model was developed to simulate the shape memory behavior in polymeric SMMs. This model was verified by a series of experiments. In addition, this model was applied for optimization of the SME. The thermo-/chemo-responsive SME in poly(methyl methacrylate) (PMMA) were systematically studied by experiments and simulation. Based on above study on the fundamentals, different surface patterning methods were developed to fabricate micro/nano-sized surface features, including well-controllable wrinkled patterns, PMMA microlens arrays, reversible surface patterns and 3-D surface patterns.

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“…When combined with nano-imprint lithography [42][43][44][45], hot embossing [46] or nano-injection molding [47], it leads to a high resolution nano-fabrication technique which can create structures down to sub-10 nm resolution [48] over large areas in a single step and into different materials with a flexibility and functionality that is easily accessible to users. There have been attempts to use mold technology for 3D patterning such as reversal imprinting [49][50][51], dissolvable molds [52] and microcontact printing using a soft mold [53]. To extend the capability of mold technology to 3D fabrication at multiple levels and/or non-planar surfaces with arbitrary directions, there are two major obstacles.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of silicon molds with multi-level, non-planar, micro- and nano-scale features

et al. 2014

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A method for single-step fabrication of arbitrary, complex, three-dimensional (3D) silicon structures from the nano- to millimeter-scale at multiple levels on non-planar, curved, or domed surfaces is reported. The fabrication is based on focused or masked ion beam irradiation of p-type silicon followed by electrochemical anodization. The process allows fabrication of a wide range of surface features at multiple heights and with arbitrary orientations by varying the irradiated feature width, ion type, energy fluence, and subsequent anodization conditions. The technology has achieved depth resolution of 10 nm as step heights and is capable of creating lateral features down to 7 nm at high aspect ratios of up to 40, with surface roughness down to 1 nm scaled up to full wafer areas. The single-step ability has seamlessly interfaced a network of complex, integrated micro- to nano-structures in 3D orientations with no alignment required. The final template has been converted to a master copy for nano-imprinting lithography of 3D fluidic structures and optical components.

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Fabrication of metallic microstructure on curved substrate by optical soft lithography and copper electroplating

Cited by 30 publications

References 27 publications

Fabrication of 3D Micro Structures on Nonplanar Substrates and Its Applications for Roll Micro contact Printing

Fabrication of 3D Micro Structures on Nonplanar Substrates and Its Applications for Roll Micro contact Printing

Shape memory technology : working mechanisms, modeling and surface patterning application

Fabrication of silicon molds with multi-level, non-planar, micro- and nano-scale features

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