Fabrication of large‐area ordered array of gold nanoparticles on c‐Si substrate and its characterisation through reflectance spectra

Abstract

Ordered arrays of substrate supported gold nanodots are fabricated on c-Si as substrate. Electron beam lithography followed by DC sputter coating was used for the fabrication of ordered gold nanodots over a 1 × 1 cm 2 area on c-Si substrate. The fabricated ordered arrays of gold nanodots were characterised through the reflectance spectra. Reduction of 60.67% in reflectance was exhibited by ordered gold nanodots when compared with bare c-Si. For comparison, a random gold nanoparticle array of approximately same particle size was fabricated and the reflectance was compared with the ordered array. It was found that the reflectance of ordered array is 52.27% less than that of random array. This route is suitable for fabrication of large area ordered gold nanodots which has applications in photovoltaic industry.