Fabrication of ideally ordered anodic porous alumina with 63 nm hole periodicity using sulfuric acid

Abstract

Nanochannel arrays with an ideally ordered hole configuration with a 63 nm hole periodicity and 15–40 nm hole diameter were fabricated using anodization of the pretextured Al in sulfuric acid solution. The SiC mold with an array of convexes, which was prepared by electron beam lithography, was used for the nanoindentation of the Al. The periodicity of convexes was adjusted to the self-organized periodicity in sulfuric acid solution. The obtained concaves on Al initiated the hole development during the anodization and generated the ideally ordered hole configuration with a 63 nm period. Under the appropriate anodization conditions, anodic porous alumina with an aspect ratio of over 20 was obtained.

Toward surround gates on vertical single-walled carbon nanotube devices

“…However, it is important to note that only one of the PAA templates used in this study had highly ordered pores, which can be achieved in thin films using additional processes. 13,27,28 With ordered pores, the uniformity of the etching will improve, thus reducing the variation in channel length across a sample. Furthermore, improvement of the initial Al film surface roughness and the dielectric layer uniformity ͑SOG in this case͒ can also increase the uniformity of channel length.…”

Nanotemplate alumina films on a silicon substrate fabricated by electrochemistry

“…Details on the electrolyte concentration and the voltage used are given in table I [12]. For each electrolyte we used two different anodization conditions, in the range of optimum conditions in the literature for the most homogeneous structures [3][4][5]. Structural characterization was performed by plan view and cross sectional TEM images and the results on pore and cell diameter as well as on pore density are given in table I.…”

“…An extensive number of references is found in the literature on thick anodic alumina films on aluminum [3][4][5] and fewer on Si [6][7][8][9] (thickness > 500 nm). However, the fabrication of very thin alumina films on Si by anodization is still an open and challenging subject of research [2,10].…”

Fundamental mechanisms of focused ion beam guided anodization

“…6 Other patterning methods include nanoindentation 7 and nanoimprint using SiC or Si 3 N 4 molds. [8][9][10][11][12] However, these methods have inherent disadvantages in guiding pore pattern formation. Both nanoindentation and nanoimprint are contact methods.…”